Abstract: A lithographic system for projecting an image onto a workpiece using radiation is provided. The lithographic system includes: a support structure for supporting a workpiece; a radiation source for providing radiation to project an image on the workpiece; a reticle positioned between the radiation source and the workpiece; and a mask positioned adjacent the reticle, the mask being configured to block radiation from the radiation source, the mask including a heat removal apparatus.

Abstract: A lithographic system for projecting an image onto a workpiece using radiation is provided. The lithographic system includes: a support structure for supporting a workpiece; a radiation source for providing radiation to project an image on the workpiece; a reticle positioned between the radiation source and the workpiece; and a mask positioned adjacent the reticle, the mask being configured to block radiation from the radiation source, the mask including a heat removal apparatus.

Abstract: A lithographic system for projecting an image onto a workpiece using radiation is provided. The lithographic system includes: a support structure for supporting a workpiece; a radiation source for providing radiation to project an image on the workpiece; a reticle positioned between the radiation source and the workpiece; and a mask positioned adjacent the reticle, the mask being configured to block radiation from the radiation source, the mask including a heat removal apparatus.

Abstract: A diffuser system (100) and method for optically diffusing a light beam (L1,L2). At least two transmissive diffuser windows (11,21) are provided. The diffuser windows (11,21) are arranged to sequentially diffuse the light beam (L1,L2) transmitted there through. The diffuser system (100) is configured to continuously rotate the diffuser windows (11,21) at an angular velocity (?1,?2) for homogenizing a diffusive pattern of the transmitted light beam (L1,L2). The diffuser windows (11,21) are configured to rotate around distinct rotation axes (C1,C2). The distinct rotation axes (C1,C2) are parallel and offset with respect to each other by a radial center distance (d12). A rotating subarea of the first diffuser window (11) partially overlaps a rotating subarea of the second rotating diffuser window (12) The partially overlapping rotating subareas define a beam window (W12) for homogenizing and diffusing the transmitted light beam (L1,L2).

Abstract: A lithographic apparatus (10) and method for preventing exposure of a peripheral portion (P) of a substrate (S). An edge mask (M) has a radial concave edge (E) that extends over less than half a circle arch. The edge mask (M) is connected to a mask carrier (4) that circumnavigates the projection system (2) to adjust a tangential coordinate (?) and a radial coordinate (R) of the edge mask (M) with respect to the optical axis (A) of the projection system (2) for inserting the edge mask (M) at a variable distance into the beam of radiation (B). The tangential and radial positions (?,R) of the edge mask (M) are coordinated with a changing position (X,Y) of the substrate (S) to prevent exposure of the peripheral portion (P) of the substrate (S) during exposure of the target region (T).

Abstract: The present disclosure concerns a photolithography apparatus (100) and method for controlling relative image size (S1/S0) of a projected substrate pattern (W). A projection system (10) is arranged for projecting an image of a mask pattern (M) as the substrate pattern (W) onto a substrate (6), wherein the projection system (10) comprises an adjustment lens (13) moveable in a range (Xmin,Xmax) encompassing a central position (X0) for controlling a relative image size (S1/S0). The projection system (10) is arranged to project the mask pattern (M) onto the adjustment lens (13) such that, when the adjustment lens (13) is positioned at the central position (X0), an apparent mask pattern (M?) from a point of view of the adjustment lens (13) appears to be at a distance (2*F) from the adjustment lens (13) that is twice a focal length (F) of the adjustment lens (13).