Abstract: Copolymers comprising 1-50 mole % of sulfur dioxide and 50-99 mole % of trialkylgermylstyrene, having a weight average molecular weight of 500-10,000,000 and exhibiting a high sensitivity to light, electron beam, and X-ray, as well as having an excellent anti-dry etching resistance, and their application as a positive resisting material.
Type:
Grant
Filed:
March 12, 1992
Date of Patent:
May 24, 1994
Assignee:
Kumho Petrochemical Company, Limited
Inventors:
Seong-Ju Kim, Ji-Hong Kim, Seong-Geun Jang, Dae-Youp Lee