Abstract: Disclosed herein is a gas barrier film formed from a mixture containing polyvinyl alcohol and a partially neutralized product of poly(meth)acrylic acid in a weight ratio of 95:5 to 10:90, and having an oxygen permeability constant of 1.25.times.10.sup.-3 ml(STP).multidot.cm/m.sup.2 .multidot.h.multidot.atm{Pa} or smaller as measured under conditions of 30.degree. C. and 80% relative humidity. A production process of the gas barrier film, in which a film formed from a mixture containing polyvinyl alcohol and a partially neutralized product of poly(meth)acrylic acid is subjected to a heat treatment under specific conditions, is also disclosed. The gas barrier film of the invention is excellent in water resistance and oxygen gas barrier property, free of any chlorine atom, and scarcely colored.

Abstract: A gas barrier laminate having a laminated structure of at least two layers includes a gas barrier film (A) formed from a mixture containing polyvinyl alcohol and poly(meth)acrylic acid or a partially neutralized product thereof in a weight ratio ranging from 95:5 to 10:90, and having an oxygen permeability constant of 1.25.times.10.sup.-3 ml(STP).multidot.cm/m.sup.2 .multidot.h.multidot.atm{Pa} or smaller as measured under conditions of 30.degree. C. and 80% relative humidity, and a layer (B) formed from a thermoplastic resin. The film (A) and layer (B) are laminated contiguously to each other. A process for the production of a gas barrier laminate having a laminated structure of at least two layers comprises a step of forming a gas barrier film (A) having an oxygen permeability constant of 1.25.times.10.sup.-3 ml(STP).multidot.cm/m.sup.2 .multidot.h.multidot.atm{Pa} or smaller as measured under conditions of 30.degree. C.

Abstract: A process for the production of a poly(arylene thioether) containing phthalic anhydride groups wherein a dihalogen-substituted aromatic compound is reacted with an alkali metal sulfide in a polar organic solvent containing water to produce the poly(arylene thioether) is disclosed. This process comprises causing a monohalogen-substituted phthalic compound to exist in a polymerization reaction system, and controlling a ratio, a/b of the number of moles, a of the charged dihalogen-substituted aromatic compound to the number of moles, b of the charged alkali metal sulfide within a range of 0.8<a/b<1.

Abstract: Disclosed herein is a gas barrier film formed from a mixture containing polyvinyl alcohol and poly(meth)acrylic acid at a weight ratio of 95:5 to 20:80, and having an oxygen permeability constant of 1.25.times.10.sup.-3 ml(STP).cm/m.sup.2.h.atm{Pa} or smaller as measured under conditions of 30.degree. C. and 80% relative humidity. A production process of the gas barrier film, in which a film formed from a mixture containing polyvinyl alcohol and poly(meth)acrylic acid is subjected to a heat treatment under specific conditions, is also disclosed. The gas barrier film of the invention are far excellent in gas barrier property under high-humidity conditions and also superb in water resistance.

Abstract: Disclosed herein is a method for preventing deterioration of an industrial material by using an azole derivative represented by the following formula ##STR1## wherein X means a halogen atom or a C.sub.1 -C.sub.5 alkyl, haloalkyl, phenyl, cyano or nitro group, n stands for 0 or an integer of 1-5, A denotes a nitrogen atom or CH, R.sub.1 and R.sub.2 mean individually a hydrogen atom or a C.sub.1 -C.sub.5 alkyl group, R.sub.3 denotes a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, and when n is an integer of 2-5, Xs may be the same or different. A biocidal composition for the method is also disclosed.

Abstract: Disclosed herein is a gas barrier film formed from a mixture containing (A) at least one poly(meth)acrylic acid polymer selected from the group consisting of poly(meth)acrylic acid and partially neutralized products of poly(meth)acrylic acid and (B) a saccharide in a weight ratio of 95:5 to 20:80, and having an oxygen gas permeability coefficient of 5.00.times.10.sup.-3 ml(STP).cm/m.sup.2.h. atm {Pa} or lower as measured under conditions of 30.degree. C. and 80% relative humidity. A production process of the gas barrier film, in which a film is formed from the mixture, and then subjected to a heat treatment under specific conditions, is also disclosed.

Abstract: In the present invention, an optically active cis type 1,2-diol derivative of the following formula (I) is produced by reacting a cis type 1,2-diol derivative of the formula (I) with a carboxylic acid derivative of the formula (II) in the presence of a lipase: ##STR1## wherein R.sup.1 and R.sup.2 independently represent hydrogen atom or an alkyl group, X represents a halogen atom, a nitro group, a cyano group, an alkyl group, a haloalkyl group, or a phenyl group, and n represents an integer of from 0 to 5; R.sup.3 represents a C.sub.1 -C.sub.10 alkyl group or an aryl group, and R.sup.4 represents a hydrogen atom, a C.sub.1 -C.sub.5 alkyl group, a C.sub.2 -C.sub.4 alkenyl group, or COR.sub.3.The cis type means that the bond between the cyclopentane ring and the hydroxy group and the bond between the cyclopentane ring and the benzyl group reside in the same direction as that portrayed on the paper.

Abstract: This invention provides a process for producing an optically active 1,2-diol derivative by optical resolution. The optically active 1,2-diol derivative of the formula (I) which is capable of utilizing as an intermediate of fungicidal optically-active azole derivatives can be produced by esterifying a 1,2-diol derivative of the formula (I) as a substrate with a carboxylic acid derivative of the formula (II) as a reagent in the presence of a lipase as a catalyst. ##STR1## wherein R.sup.1 is C1-C5 alkyl group, C3-C7 cycloalkyl group or C1-C5 haloalkyl group, R.sup.2 is C1-C3 alkyl group substituted by a phenyl group which may have one or two halogen atoms and/or C1-C4 alkyl groups, C2-C3 alkenyl group substituted by a phenyl group which may have one or two halogen atoms and/or C1-C4 alkyl groups, or C1-C3 alkyl group substituted by a phenoxy group which may have one or two halogen atoms and/or C1-C4 alkyl groups, R.sup.3 is C1-C10 alkyl group or aryl group, and R.sup.

Abstract: Disclosed herein are an aromatic thioether ketone/thioether sulfone random copolymer comprising phenylene thioether ketone recurring units (I) and phenylene thioether sulfone recurring units (II), (a) the compositional ratio (I:II) of the recurring units (I) to the recurring units (II) ranging from 98:2 to 65:35, (b) the solution viscosity (.eta..sub.inh) being at least 0.3 dl/g, (c) the melt crystallization time (.tau.) being at least 3 minutes, (d) the melting point (Tm) being 300.degree.-350.degree. C., (e) the glass transition temperature being at least 125.degree. C., (f) the retention (400.degree. C./20 min) of melt crystallization enthalpy (.DELTA.Hmc) being at least 60%, and (g) the average particle size being at least 0.1 mm, and the production process thereof.

Abstract: Disclosed herein are electronic device sealing resin compositions containing (A) 40-25 parts by weight of a thermoplastic resin composed of 100-10 wt. % of a poly(arylene thioether-ketone) and 0-90 wt. % of a poly(arylene sulfide), (B) 60-75 parts by weight of an inorganic filler, and per 100 parts by weight of the sum of the thermoplastic resin (A) and inorganic filler (B), (C) 1.5-5 parts by weight of a silicone oil, (D) 10-15 parts by weight of a silicone rubber or (C) 0.5-3 parts by weight of a silicone oil and (D) 5-13 parts by weight of a silicone rubber. Electronic devices sealed using such resin compositions are also disclosed.

Abstract: This invention provides a simple process for production of an (azolylmethyl)(biphenylmethyl)cyclopentanol derivative represented by the following formula (I) in a good yield. This process comprises, as described in the following reaction formula, reacting an (azolylmethyl)(halogenophenylmethyl)cyclopentanol derivative represented by the following formula (II) with a benzene derivative represented by the following formula (III) by light irradiation. ##STR1## wherein X denotes a halogen atom, R.sup.1 and R.sup.2 denote independently a hydrogen atom or a C1-C5 alkyl group, R.sup.3 denotes a C1-C5 alkyl group, n means an integer of 0-2, and A represents CH or N.

Abstract: Disclosed herein are an aromatic thioether ketone/thioether sulfone random copolymer comprising phenylene thioether ketone recurring units (I) and phenylene thioether sulfone recurring units (II), (a) the compositional ratio (I:II) of the recurring units (I) to the recurring units (II) ranging from 98:2 to 65:35, (b) the solution viscosity (.eta..sub.inh) being at least 0.3 dl/g, (c) the melt crystallization time (.tau.) being at least 3 minutes, (d) the melting point (Tm) being 300.degree.-350.degree. C., (e) the glass transition temperature being at least 125.degree. C., (f) the retention (400.degree. C./20 min) of melt crystallization enthalpy (.DELTA.Hmc) being at least 60%, and (g) the average particle size being at least 0.1 mm, and the production process thereof.

Abstract: Disclosed herein are poly(phenylene sulfide) fibers having a tensile strength of at least 3.5 g/d, a knot tenacity of at least 2 g/d, a loop tenacity of at least 3.5 g/d, the number of abrasion cycles until breaking in a flexing abrasion test of at least 3,000 times, and the number of repeated flexings until breaking in a flexural fatigue test of at least 150 times. A process for the production of poly(phenylene sulfide) fibers, which comprises melt-spinning a poly(phenylene sulfide), stretching the resultant unstretched filaments at a draw ratio of 2:1 to 7:1 within a temperature range of 80.degree.-260.degree. C., and heat-treating the stretched filaments for 0.1-30 seconds under conditions of a take-up ratio of 0.8:1 to 1.35:1 in a dry heat atmosphere exceeding 285.degree. C., but not exceeding 385.degree. C. is also disclosed.

Abstract: Disclosed herein are a poly(arylene thioether-ketone) copolymer comprising (A) at least one poly(arylene thioether-ketone) segment having predominant recurring units of the formula ##STR1## wherein the --CO-- and --S-- are in the para position to each other and (B) at least one poly(arylene thioether) segment having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) segment (B) to the total amount of the poly(arylene thioether-ketone) segment (A) ranging from 0.05 to 5 by weight, (b) the number-average polymerization degree of the poly(arylene thioether) segment (B) being higher than 1 but lower than 10, and (c) said copolymer having a melt viscosity of 2-100,000 poises as measured at 350.degree. C. and a shear rate of 1,200/sec as well as a production process of the poly(arylene thioether-ketone) copolymer.

Abstract: Disclosed herein are a poly(arylene thioether-ketone) copolymer comprising (A) at least one poly(arylene thioether-ketone) segment having predominant recurring units of the formula ##STR1## wherein the --CO-- and --S-- are in the para position to each other, and (B) at least one poly(arylene thioether) segment having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) segment (B) to the total amount of the poly(arylene thioether-ketone) segment (A) ranging from 0.05 to 5 by weight, (b) the number-average polymerization degree of the poly(arylene thioether) segment (B) being higher than 1 but lower than 10, and (c) said copolymer having a melt viscosity of 2-100,000 poises as measured at 350.degree. C. and a shear rate of 1,200/sec as well as a production process of the poly(arylene thioether-ketone) copolymer.

Abstract: Phenyl (1,3,5-triazin-2-yl)carbamates of the formula (I): ##STR1## wherein R.sup.1 is H, C.sub.1 -C.sub.4 alkyl or C.sub.1 -C.sub.4 alkoxy, R.sup.2 and R.sup.3 are independently H, halogen atom, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, C.sub.1 -C.sub.4 alkylthio, C.sub.1 -C.sub.4 haloalkyl, C.sub.1 -C.sub.4 haloalkoxy, C.sub.1 -C.sub.4 haloalkylthio, C.sub.2 -C.sub.4 alkoxyalkyl or NR.sup.7 R.sup.8 (R.sup.7, R.sup.8 : H or C.sub.1 -C.sub.4 alkyl, independently), and R.sup.4, R.sup.5 and R.sup.6 are independently H, halogen atom, C.sub.1 -C.sub.4 alkyl or C.sub.1 -C.sub.4 alkoxy, are prepared by reacting a 2-amino-1,3,5-triazine of the formula (II): ##STR2## with a diphenyl carbonate of the formula (III): ##STR3## in the presence of an alkali metal hydride in an acrotic polar solvent. An parotic polar solvent mixture of the phenyl (1,3,5-triazin-2-yl)carbamate of the formula (I) and an alkali metal phenoxide is also disclosed.

Abstract: A resin composition includes a poly(arylene thioether) and a polyamide. At least part of the poly(arylene thioether) consists of a poly(arylene thioether) containing phthalic anhydride groups.

Abstract: A poly(arylene sulfide) resin composition in which the tendency of a poly(arylene sulfide) resin to cause metals making up molds, processing machinery, metal parts of inserts and the like to corrode has been inhibited, and which has good processability includes the poly(arylene sulfide) resin and, as a corrosion inhibitor, at least one substance selected from the group consisting of a metallic simple substance of molybdenum, oxoacids of molybdenum, alkali metal salts of the oxoacids of molybdenum, alkaline earth metal salts of the oxoacids of molybdenum, the ammonium salts of the oxoacids of molybdenum, the zinc salts of the oxoacids of molybdenum, a metallic simple substance of tungsten, oxoacids of tungsten, alkali metal salts of the oxoacids of tungsten, alkaline earth metal salts of the oxoacids of tungsten, the ammonium salts of the oxoacids of tungsten and the zinc salts of the oxoacids of tungsten. The corrosion inhibitor being incorporated in a proportion within a range of 0.

Abstract: Disclosed herein are a poly(arylene thioether) block copolymer alternately comprising (A) at least one poly(arylene thioetherketoneketone) block having predominant recurring units of the formula ##STR1## and (B) at least one poly(arylene thioether) block having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) block (B) to the total amount of the poly(arylene thioetherketoneketone) block (A) being within a range of 0.1-9 by weight, (B) the weight average molecular weight of the poly(arylene thioether) block (B) being at least 1,000, and (c) said block copolymer having a melt viscosity of 2-100,000 poises as measured at 380.degree. C. and a shear rate of 1,200/sec as well as a production process of the block copolymer.

Abstract: Disclosed herein are a poly(arylene thioether) block copolymer alternately comprising (A) at least one poly(arylene thioetherketoneketone) block having predominant recurring units of the formula ##STR1## and (B) at least one poly(arylene thioether) block having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) block (B) to the total amount of the poly(arylene thioetherketoneketone) block (A) being within a range of 0.1-9 by weight, (B) the weight average molecular weight of the poly(arylene thioether) block (B) being at least 1,000, and (c) said block copolymer having a melt viscosity of 2-100,000 poises as measured at 380.degree. C. and a shear rate of 1,200/sec as well as a production process of the block copolymer.