Patents Assigned to Kyowa Gas Chemical Industry Co., Ltd.
-
Patent number: 5006415Abstract: A molded article of methacrylic resin formed of a cross-linked polymer having at least part of the surface thereof coated with an abrasion resistant layer in contact with a basic molding material made of a methacrylic partially cross-linked gel thereby allowing the methacrylic partially cross-linked gel consequently produced to possess the property of retaining the polymerization in a stopped state, and simultaneously polymerizing said two materials held in mutual contact under a condition capable of imparting a desired shape to the combined materials.Type: GrantFiled: November 17, 1988Date of Patent: April 9, 1991Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Shigeo Matsumaru, Akihiro Mochizuki, Syuzi Isoi
-
Patent number: 4990319Abstract: A process for producing NH.sub.3 and SO.sub.2 from ammonium sulfate, which comprises(i) reacting ammonium sulfate with a metal oxide or hydroxide at a temperature of not more than 200.degree. C. to form NH.sub.3, water and a metal sulfate and recovering NH.sub.3,(ii) decomposing the metal sulfate in the presence of a reducing agent to form a metal oxide and SO.sub.2 and recovering SO.sub.2, and(iii) recycling the metal oxide to step (i) as such or after it is converted to a metal hydroxide.Type: GrantFiled: March 13, 1989Date of Patent: February 5, 1991Assignees: Kuraray Co., Ltd., Kyowa Gas Chemical Industry Co., Ltd., JGC CorporationInventors: Youji Takenouchi, Katsuhiko Nishiguchi, Kunio Abe
-
Patent number: 4987252Abstract: In order to recover methacrolein and/or methacrylic acid by quenching a reaction product gas obtained by catalytic oxidation of isobutylene or the like, the reaction product gas is charged into a quench column through a double-wall pipe and is then brought into contact with a condensate as a cooling medium. Deposition of terephthalic acid and the like inside the column is prevented by controlling the temperature of a bottom in the quench column and that of an overhead gas of a quench column unit. An aromatic carboxylic acid, aromatic aldehyde, metal powder is added to an aqueous solution of methacrylic acid, which contains terephthalic acid and the like, so that the terephthalic acid and the like are caused to precipitate for their removal.Type: GrantFiled: June 27, 1988Date of Patent: January 22, 1991Assignees: Mitsui Toatsu Chemicals, Incorporated, Kyowa Gas Chemical Industry Co., Ltd.Inventors: Morimasa Kuragano, Kozo Iwasaki, Takeshi Isobe, Isao Fukada, Minoru Koshibe, Yoshihiro Sezaki, Hirozo Segawa, Katsuji Yoguchi
-
Patent number: 4947847Abstract: An electrically conductive adhesive, formed by polymerizing and cross-linking(a) a radically polymerizable ionic unsaturated monomer soluble in a mixture of a water-soluble polyhydric alcohol with water,(b) a trialkoxysilylalkyl (meth)acrylate represented by the general formula I: ##STR1## wherein R.sup.1 denotes hydrogen atom or methyl group, R.sup.2 an alkyl group of 1 or 2 carbon atoms, and n an integer of the value of 2 or 3, and(c) a (meth)acrylate represented by the general formula II: ##STR2## wherein R.sup.1 denotes the same meaning as defined above, R.sup.3 hydrogen atom or an alkyl group of 1 to 4 carbon atoms, and m an integer of the value of 1 to 23, in the presence of(d) a water-soluble polyhydric alcohol and (e) water,(e) a method of producing the same, and an electrode comprising the same, are all disclosed.Type: GrantFiled: August 3, 1988Date of Patent: August 14, 1990Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Kozo Nakao, Susumu Hirokawa
-
Patent number: 4879412Abstract: Disclosed herein is a process for bringing methacrylic acid, which has been obtained by the catalytic oxidation of compound having 4 carbon atoms, into contact with a basic anion-exchange resin so as to remove byproduced dibasic acids and the like from the methacrylic acid and to purify the same.Type: GrantFiled: March 3, 1986Date of Patent: November 7, 1989Assignees: Mitsui Toatsu Chemicals, Inc., Kyowa Gas Chemical Industry Co., Ltd.Inventors: Kozo Iwasaki, Morimasa Kuragano, Minoru Koshibe, Yoshihiro Sezaki, Katsuji Yoguchi, Yoshio Koyama
-
Patent number: 4842768Abstract: An electrically conductive adhesive, formed by polymerizing and cross-linking(a) a radically polymerizable ionic unsaturated monomer soluble in a mixture of a water-soluble polyhydric alcohol with water,(b) a trialkoxysilylalkyl (meth)acrylate represented by the general formula I: ##STR1## wherein R.sup.1 denotes hydrogen atom or methyl group, R.sup.2 an alkyl group of 1 or 2 carbon atoms, and n an integer of the value of 2 or 3, and(c) a (meth)acrylate represented by the general formula II: ##STR2## wherein R.sup.1 denotes the same meaning as defined above, R.sup.3 hydrogen atom or an alkyl group of 1 to 4 carbon atoms, and m an integer of the value of 1 to 23, in the presence of(d) a water-soluble polyhydric alcohol and (e) water.Type: GrantFiled: January 15, 1986Date of Patent: June 27, 1989Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Kozo Nakao, Susumu Hirokawa
-
Patent number: 4830803Abstract: A molded article of methacrylic resin formed of a cross-linked polymer having at least part of the surface thereof coated with an abrasion resistant layer in contact with a basic molding material made of a methacrylic partially cross-linked gel thereby allowing the methacrylic partially cross-linked gel consequently produced to possess the property of retaining the polymerization in a stopped state, and simultaneously polymerizing said two materials held in mutual contact under a condition capable of imparting a desired shape to the combined materials.Type: GrantFiled: January 20, 1987Date of Patent: May 16, 1989Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Shigeo Matsumaru, Akihiro Mochizuki, Syuzi Isoi
-
Patent number: 4791184Abstract: A methacrylic resin molding material, comprising a partially cross-linked polymer gel obtained by partially polymerizing a mixture comprising (A) a resin raw material selected from the group consisting of monomeric alkyl methacrylates, .alpha., .beta.Type: GrantFiled: June 29, 1987Date of Patent: December 13, 1988Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Haruo Nagai, Tetsuo Suzuki, Kazuhiro Sato
-
Patent number: 4504616Abstract: A neodymium-containing transparent resin comprising (A) a copolymer of (i) at least one monomer selected from the group consisting of alkyl methacrylates having alkyl groups of 1 to 4 carbon atoms and styrene with (ii) at least one copolymerizable unsaturated carboxylic acid or a salt thereof selected from the group consisting of acrylic acid, methacrylic acid and neodymium salts thereof and (B) at least one compound selected from the group consisting of saturated or unsaturated organic carboxylic acids substituted or unsubstituted with a hydroxyl group and having 6 to 21 carbon atoms, and neodymium salts thereof, which transparent resin is characterized by having a neodymium content in the range of 0.Type: GrantFiled: July 28, 1983Date of Patent: March 12, 1985Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Hiroshi Uehara, Tohru Shimizu
-
Patent number: 4495084Abstract: A plastic scintillator which comprises using as the matrix resin thereof a copolymer obtained by polymerizing (a) at least one compound represented by the general formula I: ##STR1## wherein, X and Y independently denote hydrogen atom or methyl group, providing that they do not exclusively denote methyl group, or a monomer mixture containing at least one compound of the general formula I in a weight proportion of at least 0.4 to the polymerizable monomer mixture to be used in the presence of (b) at least one monomer having at least two carbon-carbon double bonds capable of radical polymerization in the molecular unit thereof.Type: GrantFiled: August 16, 1982Date of Patent: January 22, 1985Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Tohru Shimizu, Junji Nakagawa
-
Patent number: 4460403Abstract: Novel 2,3-dicyanopyrazine derivatives of the formula ##STR1## wherein A represents a hydrogen atom, a lower alkyl group, an unsubstituted or substituted phenyl group, a benzyl group, or a group of the formula --ZR.sub.1 in which Z represents an oxygen or sulfur atom and R.sub.1 represents an unsubstituted or substituted lower alkyl group, a lower alkenyl group, a lower alkynyl group, an unsubstituted or substituted phenyl group, or an unsubstituted or substituted benzyl group; and B represents a halogen atom, an alkyl group containing at least 3 carbon atoms, a phenyl group having a substituent at the ortho- and/or meta-position of the benzene ring, a group of the formula ZR.sub.1 in which Z and R.sub.1 are as defined, or a group of the formula ##STR2## in which R.sub.2 and R.sub.Type: GrantFiled: November 4, 1980Date of Patent: July 17, 1984Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Tetsuo Takematsu, Hirozo Segawa, Takamaro Miura, Toshiei Ataka, Michio Chatani, Akira Nakamura
-
Patent number: 4275174Abstract: A neutron shielding polymer composition comprising a polymerization product of a base monomer ingredient containing as an essential ingredient at least one monomer selected from the group consisting of alkyl methacrylates containing 1-4 carbon atoms in the alkyl group and styrene in admixture with a saturated boric acid ester which contains as an essential constituent component a polyol containing 3-16 carbon atoms and in which a molar ratio A of said polyol to boron atoms in said boric acid ester formed from said polyol being in the range of 0.6<A<4, the boron content B (wt. %) in the total monomer mixture being in the range of 1.ltoreq.B<6.Type: GrantFiled: April 26, 1979Date of Patent: June 23, 1981Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Shin-ichi Tadokoro, Hirozo Segawa
-
Patent number: 4259489Abstract: Novel 2,3-dicyanopyrazine derivatives of the formula ##STR1## wherein A represents a hydrogen atom, a lower alkyl group, an unsubstituted or substituted phenyl group, a benzyl group, or a group of the formula -ZR.sub.1 in which Z represents an oxygen or sulfur atom and R.sub.1 represents an unsubstituted or substituted lower alkyl group, a lower alkenyl group, a lower alkynyl group, an unsubstituted or substituted phenyl group, or an unsubstituted or substituted benzyl group; and B represents a halogen atom, an alkyl group containing at least 3 carbon atoms, a phenyl group having a substituent at the ortho- and/or meta-position of the benzene ring, a group of the formula ZR.sub.1 in which Z and R.sub.1 are as defined, or a group of the formula ##STR2## in which R.sub.2 and R.sub.Type: GrantFiled: December 15, 1978Date of Patent: March 31, 1981Assignee: Kyowa Gas Chemical Industry Co. Ltd.Inventors: Tetsuo Takematsu, Hirozo Segawa, Takamaro Miura, Toshiei Ataka, Michio Chatani, Akira Nakamura
-
Patent number: 4182821Abstract: A method for producing a lead containing monomer composition comprising reacting a mixture comprising (1) at least one monomer selected from the group consisting of alkyl methacrylate having 1-4 carbon atoms in an alkyl group, hydroxyalkyl acrylate, hydroxyalkyl methacrylate and styrene, (2) acrylic or methacrylic acid, (3) an organic acid having the general formula: R.sub.1 COOH, wherein R.sub.1 is hydrocarbon residue having 5-20 carbon atoms and optionally (4) an organic acid having the general formula: R.sub.2 COOH, wherein R.sub.2 is hydrocarbon residue having 2-4 carbon atoms with lead monoxide. The composition is polymerized to obtain a radiation shielding polymer.Type: GrantFiled: November 14, 1977Date of Patent: January 8, 1980Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Haruo Nagai, Hiroshi Uehara, Kunikazu Nunokawa
-
Patent number: 4172177Abstract: A water-insoluble hydrophilic polymer composition capable of crosslinking at ambient temperature. The composition contains (A) a water-insoluble hydrophilic copolymer prepared by copolymerizing (a) at least one carboxyl group containing ethylenically unsaturated monomer selected from acrylic acid, methacrylic acid, maleic anhydride, fumaric acid, itaconic acid and citraconic acid, (b) at least one amino group containing ethylenically unsaturated monomer of the formula: ##STR1## where R.sub.1 -R.sub.4 are specifically defined, and (c) an ethylenically unsaturated monomer selected from (i) a monomer of the formula: ##STR2## (R.sub.6 being alkyl), (II) A MONOMER OF THE FORMULA: ##STR3## and (iii) diacetone acrylamide, and (B) a polyepoxide crosslinking agent having at least two terminal epoxy groups. The water absorption rate of the polymer can be adjusted over a wide range and has sufficient coating strength and bonding strength to withstand long periods of immersion in water.Type: GrantFiled: December 13, 1977Date of Patent: October 23, 1979Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventor: Bunya Sato
-
Patent number: 4129524Abstract: A radiation shielding material of a composition containing a polymer comprising (A) at least one essential monomer selected from the group consisting of alkyl methacrylate having 1 - 4 carbon atoms in an alkyl group, hydroxyalkyl acrylate, hydroxyalkyl methacrylate and styrene and (B) lead acrylate or lead methacrylate, and a lead carboxylate represented by the general formula: (RCOO).sub.a Pb, a being an integer equal to the valency of lead and R representing a saturated or unsaturated hydrocarbon residue having 5 - 20 carbon atoms, wherein the ratio x (% by weight) of the lead acrylate or lead methacrylate to the total constituent monomer in the polymer and the compounding ratio y (parts by weight) of the lead carboxylate to 100 parts by weight of said total monomer in said composition satisfy any one of the following three formulas I, II and III:200.gtoreq.y.gtoreq.2, where 9.ltoreq.x.ltoreq.30 (I)200.gtoreq.y.gtoreq.2/5(x - 30)+ 2, where 30.ltoreq.x.ltoreq.75(II) and200.gtoreq.y.gtoreq.Type: GrantFiled: July 13, 1977Date of Patent: December 12, 1978Assignee: Kyowa Gas Chemical Industry Co., Ltd.Inventors: Haruo Nagai, Hiroshi Uehara, Kunikazu Nunokawa
-
Patent number: 4011277Abstract: Novel 2,6,10,15,19,23-hexamethyltetracosane-10,15-diol derivatives. Such derivatives are prepared by hydrogenation of 2,6,10,15,19,23-hexamethyltetracosa-11,13-diyne-10,15-diol derivatives and used as starting materials for preparing squalane.Type: GrantFiled: March 25, 1974Date of Patent: March 8, 1977Assignees: Kuraray Co., Ltd., Kyowa Gas Chemical Industry Co., Ltd.Inventors: Takashi Nishida, Yoichi Ninagawa, Kazuo Itoi, Yutaka Omura, Haruo Nagai