Patents Assigned to Kyowa Gas Chemical Industry Co., Ltd.
  • Patent number: 5006415
    Abstract: A molded article of methacrylic resin formed of a cross-linked polymer having at least part of the surface thereof coated with an abrasion resistant layer in contact with a basic molding material made of a methacrylic partially cross-linked gel thereby allowing the methacrylic partially cross-linked gel consequently produced to possess the property of retaining the polymerization in a stopped state, and simultaneously polymerizing said two materials held in mutual contact under a condition capable of imparting a desired shape to the combined materials.
    Type: Grant
    Filed: November 17, 1988
    Date of Patent: April 9, 1991
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Shigeo Matsumaru, Akihiro Mochizuki, Syuzi Isoi
  • Patent number: 4990319
    Abstract: A process for producing NH.sub.3 and SO.sub.2 from ammonium sulfate, which comprises(i) reacting ammonium sulfate with a metal oxide or hydroxide at a temperature of not more than 200.degree. C. to form NH.sub.3, water and a metal sulfate and recovering NH.sub.3,(ii) decomposing the metal sulfate in the presence of a reducing agent to form a metal oxide and SO.sub.2 and recovering SO.sub.2, and(iii) recycling the metal oxide to step (i) as such or after it is converted to a metal hydroxide.
    Type: Grant
    Filed: March 13, 1989
    Date of Patent: February 5, 1991
    Assignees: Kuraray Co., Ltd., Kyowa Gas Chemical Industry Co., Ltd., JGC Corporation
    Inventors: Youji Takenouchi, Katsuhiko Nishiguchi, Kunio Abe
  • Patent number: 4987252
    Abstract: In order to recover methacrolein and/or methacrylic acid by quenching a reaction product gas obtained by catalytic oxidation of isobutylene or the like, the reaction product gas is charged into a quench column through a double-wall pipe and is then brought into contact with a condensate as a cooling medium. Deposition of terephthalic acid and the like inside the column is prevented by controlling the temperature of a bottom in the quench column and that of an overhead gas of a quench column unit. An aromatic carboxylic acid, aromatic aldehyde, metal powder is added to an aqueous solution of methacrylic acid, which contains terephthalic acid and the like, so that the terephthalic acid and the like are caused to precipitate for their removal.
    Type: Grant
    Filed: June 27, 1988
    Date of Patent: January 22, 1991
    Assignees: Mitsui Toatsu Chemicals, Incorporated, Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Morimasa Kuragano, Kozo Iwasaki, Takeshi Isobe, Isao Fukada, Minoru Koshibe, Yoshihiro Sezaki, Hirozo Segawa, Katsuji Yoguchi
  • Patent number: 4947847
    Abstract: An electrically conductive adhesive, formed by polymerizing and cross-linking(a) a radically polymerizable ionic unsaturated monomer soluble in a mixture of a water-soluble polyhydric alcohol with water,(b) a trialkoxysilylalkyl (meth)acrylate represented by the general formula I: ##STR1## wherein R.sup.1 denotes hydrogen atom or methyl group, R.sup.2 an alkyl group of 1 or 2 carbon atoms, and n an integer of the value of 2 or 3, and(c) a (meth)acrylate represented by the general formula II: ##STR2## wherein R.sup.1 denotes the same meaning as defined above, R.sup.3 hydrogen atom or an alkyl group of 1 to 4 carbon atoms, and m an integer of the value of 1 to 23, in the presence of(d) a water-soluble polyhydric alcohol and (e) water,(e) a method of producing the same, and an electrode comprising the same, are all disclosed.
    Type: Grant
    Filed: August 3, 1988
    Date of Patent: August 14, 1990
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Kozo Nakao, Susumu Hirokawa
  • Patent number: 4879412
    Abstract: Disclosed herein is a process for bringing methacrylic acid, which has been obtained by the catalytic oxidation of compound having 4 carbon atoms, into contact with a basic anion-exchange resin so as to remove byproduced dibasic acids and the like from the methacrylic acid and to purify the same.
    Type: Grant
    Filed: March 3, 1986
    Date of Patent: November 7, 1989
    Assignees: Mitsui Toatsu Chemicals, Inc., Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Kozo Iwasaki, Morimasa Kuragano, Minoru Koshibe, Yoshihiro Sezaki, Katsuji Yoguchi, Yoshio Koyama
  • Patent number: 4842768
    Abstract: An electrically conductive adhesive, formed by polymerizing and cross-linking(a) a radically polymerizable ionic unsaturated monomer soluble in a mixture of a water-soluble polyhydric alcohol with water,(b) a trialkoxysilylalkyl (meth)acrylate represented by the general formula I: ##STR1## wherein R.sup.1 denotes hydrogen atom or methyl group, R.sup.2 an alkyl group of 1 or 2 carbon atoms, and n an integer of the value of 2 or 3, and(c) a (meth)acrylate represented by the general formula II: ##STR2## wherein R.sup.1 denotes the same meaning as defined above, R.sup.3 hydrogen atom or an alkyl group of 1 to 4 carbon atoms, and m an integer of the value of 1 to 23, in the presence of(d) a water-soluble polyhydric alcohol and (e) water.
    Type: Grant
    Filed: January 15, 1986
    Date of Patent: June 27, 1989
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Kozo Nakao, Susumu Hirokawa
  • Patent number: 4830803
    Abstract: A molded article of methacrylic resin formed of a cross-linked polymer having at least part of the surface thereof coated with an abrasion resistant layer in contact with a basic molding material made of a methacrylic partially cross-linked gel thereby allowing the methacrylic partially cross-linked gel consequently produced to possess the property of retaining the polymerization in a stopped state, and simultaneously polymerizing said two materials held in mutual contact under a condition capable of imparting a desired shape to the combined materials.
    Type: Grant
    Filed: January 20, 1987
    Date of Patent: May 16, 1989
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Shigeo Matsumaru, Akihiro Mochizuki, Syuzi Isoi
  • Patent number: 4791184
    Abstract: A methacrylic resin molding material, comprising a partially cross-linked polymer gel obtained by partially polymerizing a mixture comprising (A) a resin raw material selected from the group consisting of monomeric alkyl methacrylates, .alpha., .beta.
    Type: Grant
    Filed: June 29, 1987
    Date of Patent: December 13, 1988
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Haruo Nagai, Tetsuo Suzuki, Kazuhiro Sato
  • Patent number: 4504616
    Abstract: A neodymium-containing transparent resin comprising (A) a copolymer of (i) at least one monomer selected from the group consisting of alkyl methacrylates having alkyl groups of 1 to 4 carbon atoms and styrene with (ii) at least one copolymerizable unsaturated carboxylic acid or a salt thereof selected from the group consisting of acrylic acid, methacrylic acid and neodymium salts thereof and (B) at least one compound selected from the group consisting of saturated or unsaturated organic carboxylic acids substituted or unsubstituted with a hydroxyl group and having 6 to 21 carbon atoms, and neodymium salts thereof, which transparent resin is characterized by having a neodymium content in the range of 0.
    Type: Grant
    Filed: July 28, 1983
    Date of Patent: March 12, 1985
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Hiroshi Uehara, Tohru Shimizu
  • Patent number: 4495084
    Abstract: A plastic scintillator which comprises using as the matrix resin thereof a copolymer obtained by polymerizing (a) at least one compound represented by the general formula I: ##STR1## wherein, X and Y independently denote hydrogen atom or methyl group, providing that they do not exclusively denote methyl group, or a monomer mixture containing at least one compound of the general formula I in a weight proportion of at least 0.4 to the polymerizable monomer mixture to be used in the presence of (b) at least one monomer having at least two carbon-carbon double bonds capable of radical polymerization in the molecular unit thereof.
    Type: Grant
    Filed: August 16, 1982
    Date of Patent: January 22, 1985
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Tohru Shimizu, Junji Nakagawa
  • Patent number: 4460403
    Abstract: Novel 2,3-dicyanopyrazine derivatives of the formula ##STR1## wherein A represents a hydrogen atom, a lower alkyl group, an unsubstituted or substituted phenyl group, a benzyl group, or a group of the formula --ZR.sub.1 in which Z represents an oxygen or sulfur atom and R.sub.1 represents an unsubstituted or substituted lower alkyl group, a lower alkenyl group, a lower alkynyl group, an unsubstituted or substituted phenyl group, or an unsubstituted or substituted benzyl group; and B represents a halogen atom, an alkyl group containing at least 3 carbon atoms, a phenyl group having a substituent at the ortho- and/or meta-position of the benzene ring, a group of the formula ZR.sub.1 in which Z and R.sub.1 are as defined, or a group of the formula ##STR2## in which R.sub.2 and R.sub.
    Type: Grant
    Filed: November 4, 1980
    Date of Patent: July 17, 1984
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Tetsuo Takematsu, Hirozo Segawa, Takamaro Miura, Toshiei Ataka, Michio Chatani, Akira Nakamura
  • Patent number: 4275174
    Abstract: A neutron shielding polymer composition comprising a polymerization product of a base monomer ingredient containing as an essential ingredient at least one monomer selected from the group consisting of alkyl methacrylates containing 1-4 carbon atoms in the alkyl group and styrene in admixture with a saturated boric acid ester which contains as an essential constituent component a polyol containing 3-16 carbon atoms and in which a molar ratio A of said polyol to boron atoms in said boric acid ester formed from said polyol being in the range of 0.6<A<4, the boron content B (wt. %) in the total monomer mixture being in the range of 1.ltoreq.B<6.
    Type: Grant
    Filed: April 26, 1979
    Date of Patent: June 23, 1981
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Shin-ichi Tadokoro, Hirozo Segawa
  • Patent number: 4259489
    Abstract: Novel 2,3-dicyanopyrazine derivatives of the formula ##STR1## wherein A represents a hydrogen atom, a lower alkyl group, an unsubstituted or substituted phenyl group, a benzyl group, or a group of the formula -ZR.sub.1 in which Z represents an oxygen or sulfur atom and R.sub.1 represents an unsubstituted or substituted lower alkyl group, a lower alkenyl group, a lower alkynyl group, an unsubstituted or substituted phenyl group, or an unsubstituted or substituted benzyl group; and B represents a halogen atom, an alkyl group containing at least 3 carbon atoms, a phenyl group having a substituent at the ortho- and/or meta-position of the benzene ring, a group of the formula ZR.sub.1 in which Z and R.sub.1 are as defined, or a group of the formula ##STR2## in which R.sub.2 and R.sub.
    Type: Grant
    Filed: December 15, 1978
    Date of Patent: March 31, 1981
    Assignee: Kyowa Gas Chemical Industry Co. Ltd.
    Inventors: Tetsuo Takematsu, Hirozo Segawa, Takamaro Miura, Toshiei Ataka, Michio Chatani, Akira Nakamura
  • Patent number: 4182821
    Abstract: A method for producing a lead containing monomer composition comprising reacting a mixture comprising (1) at least one monomer selected from the group consisting of alkyl methacrylate having 1-4 carbon atoms in an alkyl group, hydroxyalkyl acrylate, hydroxyalkyl methacrylate and styrene, (2) acrylic or methacrylic acid, (3) an organic acid having the general formula: R.sub.1 COOH, wherein R.sub.1 is hydrocarbon residue having 5-20 carbon atoms and optionally (4) an organic acid having the general formula: R.sub.2 COOH, wherein R.sub.2 is hydrocarbon residue having 2-4 carbon atoms with lead monoxide. The composition is polymerized to obtain a radiation shielding polymer.
    Type: Grant
    Filed: November 14, 1977
    Date of Patent: January 8, 1980
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Haruo Nagai, Hiroshi Uehara, Kunikazu Nunokawa
  • Patent number: 4172177
    Abstract: A water-insoluble hydrophilic polymer composition capable of crosslinking at ambient temperature. The composition contains (A) a water-insoluble hydrophilic copolymer prepared by copolymerizing (a) at least one carboxyl group containing ethylenically unsaturated monomer selected from acrylic acid, methacrylic acid, maleic anhydride, fumaric acid, itaconic acid and citraconic acid, (b) at least one amino group containing ethylenically unsaturated monomer of the formula: ##STR1## where R.sub.1 -R.sub.4 are specifically defined, and (c) an ethylenically unsaturated monomer selected from (i) a monomer of the formula: ##STR2## (R.sub.6 being alkyl), (II) A MONOMER OF THE FORMULA: ##STR3## and (iii) diacetone acrylamide, and (B) a polyepoxide crosslinking agent having at least two terminal epoxy groups. The water absorption rate of the polymer can be adjusted over a wide range and has sufficient coating strength and bonding strength to withstand long periods of immersion in water.
    Type: Grant
    Filed: December 13, 1977
    Date of Patent: October 23, 1979
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventor: Bunya Sato
  • Patent number: 4129524
    Abstract: A radiation shielding material of a composition containing a polymer comprising (A) at least one essential monomer selected from the group consisting of alkyl methacrylate having 1 - 4 carbon atoms in an alkyl group, hydroxyalkyl acrylate, hydroxyalkyl methacrylate and styrene and (B) lead acrylate or lead methacrylate, and a lead carboxylate represented by the general formula: (RCOO).sub.a Pb, a being an integer equal to the valency of lead and R representing a saturated or unsaturated hydrocarbon residue having 5 - 20 carbon atoms, wherein the ratio x (% by weight) of the lead acrylate or lead methacrylate to the total constituent monomer in the polymer and the compounding ratio y (parts by weight) of the lead carboxylate to 100 parts by weight of said total monomer in said composition satisfy any one of the following three formulas I, II and III:200.gtoreq.y.gtoreq.2, where 9.ltoreq.x.ltoreq.30 (I)200.gtoreq.y.gtoreq.2/5(x - 30)+ 2, where 30.ltoreq.x.ltoreq.75(II) and200.gtoreq.y.gtoreq.
    Type: Grant
    Filed: July 13, 1977
    Date of Patent: December 12, 1978
    Assignee: Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Haruo Nagai, Hiroshi Uehara, Kunikazu Nunokawa
  • Patent number: 4011277
    Abstract: Novel 2,6,10,15,19,23-hexamethyltetracosane-10,15-diol derivatives. Such derivatives are prepared by hydrogenation of 2,6,10,15,19,23-hexamethyltetracosa-11,13-diyne-10,15-diol derivatives and used as starting materials for preparing squalane.
    Type: Grant
    Filed: March 25, 1974
    Date of Patent: March 8, 1977
    Assignees: Kuraray Co., Ltd., Kyowa Gas Chemical Industry Co., Ltd.
    Inventors: Takashi Nishida, Yoichi Ninagawa, Kazuo Itoi, Yutaka Omura, Haruo Nagai