Patents Assigned to Kyowa Hakko Chemical Co., Ltd.
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Publication number: 20110172468Abstract: One object of the present invention is to provide a method for producing an alcohol which can produce a target alcohol containing a remarkably low content of the sulfur compound(s), and the present invention provides a method for producing an alcohol comprising a separation process which reduces the content of sulfur compound(s) in a crude alcohol containing at least the sulfur compound(s) through desulfurization treatment in which the crude alcohol is contacted with a separation membrane based on a pervaporation method, thereby a content of the sulfur composition in the crude alcohol is decreased.Type: ApplicationFiled: September 17, 2009Publication date: July 14, 2011Applicants: JGC CORPORATION, KYOWA HAKKO BIO CO., LTD., KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Hisashi Yamamoto, Naoyoshi Iwasaki, Shigeki Nagamatsu, Yukitoshi Fukuda, Hiromichi Hidaka, Atsushi Kouno, Yoshihiro Katoh
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Patent number: 7902406Abstract: The present invention provides a lubricating oil comprising an alicyclic compound represented by a general formula (I): wherein n is an integer of 0 or 1; one of R1 and R2 represents —CH2OR4 (wherein R4 represents a carboxylic acid residue) while the other one represents alkyl, lower alkyl-substituted or unsubstituted cycloalkyl, aryl, or aralkyl; and R3 represents —CH2OR5 (wherein R5 represents a carboxylic residue) and the like. The lubricating oil of the present invention has an excellent traction coefficient, excellent heat resistance, or the like. For the lubricating oil of the present invention, the alicyclic compound represented by the general formula (I) can be directly used as it is, and other base oils such as ester oil, poly-?-olefin, mineral oil, or silicone oil may be included therein, if necessary.Type: GrantFiled: September 13, 2006Date of Patent: March 8, 2011Assignee: Kyowa Hakko Chemical Co., Ltd.Inventors: Suguru Ohara, Satoshi Hiyoshi, Yukihiro Isogai, Makoto Goto
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Publication number: 20100298183Abstract: An additive for oils that is capable of imparting oils such as lubricant base oils with superior wear resistance properties or friction resistance properties, and a lubricant. An additive for oils that includes a compound represented by formula (I) is used. A and B each represents a single bond or hydrocarbylene or the like, X and Y each represents a sulfur atom or single bond, and W and Z each represents a hydrogen atom or —NR1R2 or the like, provided that W and Z are not both hydrogen atoms. R1 and R2 each represents a hydrogen atom, a hydrocarbyl or a hydrocarbylcarbonyl or the like, and n and m each represents an integer of 0 to 5.Type: ApplicationFiled: May 7, 2008Publication date: November 25, 2010Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Satoshi Hiyoshi, Shingo Nakayama, Nobuhito Amemiya, Shigeaki Kato, Toshihiro Inayama, Yukihiro Isogai, Ichiro Minami, Shigeyuki Mori
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Publication number: 20100286008Abstract: An additive for oils that is capable of imparting oils such as lubricant base oils or fuel oils with superior wear resistance properties or superior friction resistance properties and the like are provided. The additive for oils comprising a compound represented by formula (I): [Chemical Formula 1] (A)m-W—(B)n ??(I) wherein m represents an integer of 0 to 4, n represents an integer of 2 to 6, A represents hydroxy or amino, W represents hydrocarbon or the like, and B represents formula (II): wherein a represents 0 or 1, X represents an oxygen atom or NH, Y represents OR1 or NHR2 (wherein R1 and R2 each represent alkyl optionally having one or more substituents or the like), and Z1 and Z2 each represent a hydrogen atom, NR3R4 (wherein R3 and R4 each represent alkyl optionally having one or more substituents or the like) or the like, and the like are provided.Type: ApplicationFiled: May 9, 2008Publication date: November 11, 2010Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Satoshi Hiyoshi, Junya Kishi, Shingo Nakayama, Suguru Ohara, Yukihiro Isogai
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Publication number: 20100272633Abstract: A method for producing an alcohol of the present invention provides an alcohol having the total sulfur content of 10 ppm by weight or less, by subjecting an alcohol having the total sulfur content of 30 ppm by weight or more and the propanols content of 200 ppm to at least one desulfurization treatment selected from at least one of a desulfurization treatment by a reaction process, a desulfurization treatment with a physical adsorbent, and a desulfurization treatment with a chemical adsorbent.Type: ApplicationFiled: December 11, 2008Publication date: October 28, 2010Applicants: JGC CORPORATION, KYOWA HAKKO BIO CO., LTD., KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Hisashi Yamamoto, Naoyoshi Iwasaki, Shigeki Nagamatsu, Nobuhiro Yamada, Yukitoshi Fukuda, Hiromichi Hidaka, Hidenobu Oda
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Publication number: 20100246363Abstract: To provide a squarylium compound forming a metal complex, expressed by the general formula (I): where R1 and R2 are the same or different and each of R1 and R2 represents a substituted or unsubstituted alkyl, aralkyl, aryl, or heterocyclic group; Q represents a metal atom having coordinating ability; q represents 2 or 3; R3 represents a substituted or unsubstituted aralkyl, or aryl group; R4 represents a substituted or unsubstituted alkyl, aralkyl, or aryl group,’ R5 represents a hydrogen atom, or substituted or unsubstituted alkyl, aralkyl, or aryl group; R6 represents a halogen atom, nitro group, cyano group, or substituted or unsubstituted alkyl, aralkyl, aryl, or alkoxy group; p represents any integer ranging from 0 to 4; and RGs are the same or different and any adjacently located two R6s optionally form a substituted or unsubstituted aromatic ring together with two adjacent carbon atoms when p is 2, 3 or 4.Type: ApplicationFiled: September 12, 2007Publication date: September 30, 2010Applicants: RICOH COMPANY, LTD., KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Tohru Yashiro, Tomomi Ishimi, Motoharu Kinugasa
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Patent number: 7687633Abstract: The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein X represents a group represented by following Formula (A): (wherein R1, R2, R3, and R4 may be the same or different and each represents a hydrogen atom, a halogen atom and the like; and R5 and R6 may be the same or different and each represent a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like; and Y represents a group represented by following Formula (C): (wherein R9 represents a halogen atom, an alkyl group optionally having substituent(s) and the like; and R10 represents a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like, and “n” represents an integer of 0 to 5].Type: GrantFiled: December 17, 2004Date of Patent: March 30, 2010Assignee: Kyowa Hakko Chemical Co., Ltd.Inventors: Ikuo Shimizu, Motoharu Kinugasa, Katsumi Ukai
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Publication number: 20090156856Abstract: The present invention provides a lubricating oil comprising an alicyclic compound represented by a general formula (I): wherein n is an integer of 0 or 1; one of R1 and R2 represents —CH2OR4 (wherein R4 represents a carboxylic acid residue) while the other one represents alkyl, lower alkyl-substituted or unsubstituted cycloalkyl, aryl, or aralkyl; and R3 represents —CH2OR5 (wherein R5 represents a carboxylic residue) and the like. The lubricating oil of the present invention has an excellent traction coefficient, excellent heat resistance, or the like. For the lubricating oil of the present invention, the alicyclic compound represented by the general formula (I) can be directly used as it is, and other base oils such as ester oil, poly-?-olefin, mineral oil, or silicone oil may be included therein, if necessary.Type: ApplicationFiled: September 13, 2006Publication date: June 18, 2009Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Suguru Ohara, Satoshi Hiyoshi, Yukihiro Isogai, Makoto Goto
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Patent number: 7521562Abstract: The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s); X represents a group represented by following Formula (A): (wherein R3 and R4 may be the same or different and represents a hydrogen atom, an alkyl group optionally having substituent(s), an alkoxy group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s), wherein R3 and R4 may be combined together with the adjacent nitrogen atom thereto form a heterocyclic group optionally having substituent(s))].Type: GrantFiled: July 27, 2005Date of Patent: April 21, 2009Assignee: Kyowa Hakko Chemical Co., Ltd.Inventors: Ikuo Shimizu, Junzo Yamano, Motoharu Kinugasa, Katsumi Ukai
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Publication number: 20090074373Abstract: The present invention provides optical filters comprising a squarylium compound represented by General Formula (I): [wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s) or the like, R3 represents a hydrogen atom or an alkyl group optionally having substituent(s), and Y represents a group represented by General Formula (A): (wherein R4 represents a hydrogen atom, an alkyl group optionally having substituent(s) or the like, R5 represents a hydrogen atom, a halogen atom or the like, and R6, R7, R8 and R9 may be the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group optionally having substituent(s) or the like)] and the like.Type: ApplicationFiled: November 18, 2005Publication date: March 19, 2009Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Junzo Yamano, Katsumi Ukai, Motoharu Kinugasa
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Publication number: 20090054697Abstract: The present invention provides a method for producing an unsaturated ether compound represented by general formula (2) below, the method comprising reacting an acetal represented by general formula (1) below in the presence of an aliphatic or aromatic sulfonic acid and an organic base having a total carbon number of 3 to 7. (In the formulae, R1, R2, and R3 may be the same or different and each represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with the adjacent carbon atom.Type: ApplicationFiled: April 26, 2006Publication date: February 26, 2009Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Ryo Numazaki, Katsuhiro Ito, Hiroshi Matsuoka, Iwao Hotta
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Publication number: 20090035702Abstract: The present invention provides a process for producing a compound having a group represented by general formula (II): (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O—C—C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).Type: ApplicationFiled: September 29, 2008Publication date: February 5, 2009Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Hiroshi Matsuoka, Junzo Yamano, Katsuhiro Ito, Ikuo Shimizu, Ryo Numazaki
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Publication number: 20090035696Abstract: Disclosed are a photoresist composition characterized by containing a polymer (A) containing a carboxyl group or a hydroxyl group, a polyfunctional alkenyl ether (B) represented by the general formula (I) below, and a photoacid generator (C) and the like. (In the formula, R1 and R2 may be the same as or different from each other and respectively represent a substituted or unsubstituted alkyl, a substituted or unsubstituted allyl, or a substituted or unsubstituted aralkyl, or alternatively R1 and R2 may form a substituted or unsubstituted alicyclic hydrocarbon ring together with an adjacent carbon atom; X represents a substituted or unsubstituted alkane from which n hydrogen atoms are removed; and n represents an integer of not less than 2.Type: ApplicationFiled: May 17, 2006Publication date: February 5, 2009Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventor: Hiroshi Matsuoka
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Patent number: 7368224Abstract: The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond. The photopolymerizable composition of the present invention is advantageously used for a visible laser recording material such as a PS (Presensitized Plate) for laser direct plate-making, a dry film resist, a digital proof, a hologram, or the like, a panchromatic sensitive material (e.g., a sensitive material for a color hologram and a sensitive material used for full-color display and containing a photopolymerizable composition in a microcapsule), paints, adhesives, and so on.Type: GrantFiled: April 3, 2003Date of Patent: May 6, 2008Assignee: Kyowa Hakko Chemical Co., Ltd.Inventors: Tsuguo Yamaoka, Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Masanori Ikuta, Kyoko Katagi
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Publication number: 20070260059Abstract: The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s); X represents a group represented by following Formula (A): (wherein R3 and R4 may be the same or different and represents a hydrogen atom, an alkyl group optionally having substituent(s), an alkoxy group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s), wherein R3 and R4 may be combined together with the adjacent nitrogen atom thereto form a heterocyclic group optionally having substituent(s))].Type: ApplicationFiled: July 27, 2005Publication date: November 8, 2007Applicant: Kyowa Hakko Chemical Co., Ltd.Inventors: Ikuo Shimizu, Junzo Yamano, Motoharu Kinugasa, Katsumi Ukai
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Publication number: 20070212622Abstract: The present invention provides a filter for electronic display devices comprising a metal complex of squarylium compound represented by General Formula (I): (wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s) and the like, R3 and R4 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s), an aralkyl group optionally having substituent(s) and the like, and M represents a metal atom having coordination function, n represents an integer of 1 to 4).Type: ApplicationFiled: October 7, 2005Publication date: September 13, 2007Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Junzo Yamano, Katsumi Ukai
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Patent number: 7247755Abstract: The present invention provides a process for producing an ?,?-bis(hydroxymethyl)alkanal represented by Formula (II): (wherein R represents an alkyl group, a cycloalkyl group, or an aryl group) which comprises reacting an aldehyde represented by Formula (I): R—CH2—CHO ??(I) (wherein R has the same meaning as defined above) with formaldehyde in the presence of a basic catalyst and a phase-transfer catalyst.Type: GrantFiled: July 22, 2004Date of Patent: July 24, 2007Assignee: Kyowa Hakko Chemical Co., Ltd.Inventors: Shinichi Konishi, Shingo Nakayama, Yukihiro Isogai, Tokuyuki Yoshimoto
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Patent number: 7242542Abstract: A filter of an electronic display device provides a clear image, the filter comprising an squarylium compound represent by formula (II): wherein R15 and R17 independently represent a hydrogen atom, a halogen atom, substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryl group, a nitro group, a cyano group, a hydroxyl group, a substituted or unsubstituted amino group, or a substituted or unsubstituted heterocyclic group; R16 and R18 independently represent an alkoxyalkoxyl-substituted alkyl group; R19 and R20 independently represent a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryl group, a nitro group, a cyano group, a hydroxyl group, a substituted or unsubstituted amino group, or a substituted or unsubstituted heterocyclic group; m represents an integer ofType: GrantFiled: July 3, 2003Date of Patent: July 10, 2007Assignee: Kyowa Hakko Chemical Co., Ltd.Inventors: Ikuo Shimizu, Motoharu Kinugasa, Hiroshi Toyoda, Masanori Ikuta, Kyoko Katagi
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Publication number: 20070112221Abstract: The present invention provides a process for producing an ?,?-bis(hydroxymethyl)alkanal represented by Formula (II): (wherein R represents an alkyl group, a cycloalkyl group, or an aryl group) which comprises reacting an aldehyde represented by Formula (I): R—CH2—CHO??(I) (wherein R has the same meaning as defined above) with formaldehyde in the presence of a basic catalyst and a phase-transfer catalyst.Type: ApplicationFiled: July 22, 2004Publication date: May 17, 2007Applicant: Kyowa Hakko Chemical Co., Ltd.Inventors: Shinichi Konishi, Shingo Nakayama, Yukihiro Isogai, Tokuyuki Yoshimoto
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Publication number: 20070105988Abstract: The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein X represents a group represented by following Formula (A): (wherein R1, R2, R3, and R4 may be the same or different and each represents a hydrogen atom, a halogen atom and the like; and R5 and R6 may be the same or different and each represent a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like; and Y represents a group represented by following Formula (C): (wherein R9 represents a halogen atom, an alkyl group optionally having substituent(s) and the like; and R10 represents a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like, and “n” represents an integer of 0 to 5].Type: ApplicationFiled: December 17, 2004Publication date: May 10, 2007Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Ikuo Shimizu, Motoharu Kinugasa, Katsumi Ukai