Patents Assigned to L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Georges Claude
  • Chemistries for TSV/MEMS/power device etching
    Patent number: 10103031
    Abstract: Replacement chemistries for the cC4F8 passivation gas in the Bosch etch process and processes for using the same are disclosed. These chemistries have the formula CxHyFz, with 1?x<7, 1?y?13, and 1?z?13. The replacement chemistries may reduce RIE lag associated with deep silicon aperture etching.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: October 16, 2018
    Assignees: L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Georges Claude, American Air Liquide, Inc., Air Liquide Electronics U.S. LP
    Inventors: Peng Shen, Christian Dussarrat, Curtis Anderson, Rahul Gupta, Vincent M. Omarjee, Nathan Stafford
  • Combined process and plant for producing compressed air and at least one air gas
    Patent number: RE38218
    Abstract: The plant comprises, on site, a compressed-air provision and distribution system (LA) with at least one dedicated air compressor (CO2, CO3), an air-gas production and provision system (LG) comprising an air treatment unit (S), with a reservoir R of the said air gas and normally fed by a compressor (CO1). In temporary operating mode, with one air compressor (CO2) off-line, the compressed air from the compressor (CO1) of the air gas provision system (S) is at least in part diverted (C), typically with pressure reduction (D), to sustain the production of the compressed air system (LA), the air gas then being at least in part provided by the reservoir (R).
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: August 19, 2003
    Assignee: L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Georges Claude
    Inventors: Xavier Vigor, Patrice Ollivier, Antoine Willemot, Lionel Barry