Abstract: Disclosed are methods and apparatuses for supplying a liquid and controlling its level inside of a container. In particular, the liquid inside of the container may be a liquid material suitable for use in a chemical vapor deposition process, wherein the liquid is controlled and supplied in a manner which minimizes the introduction of impurities.
Type:
Application
Filed:
January 27, 2010
Publication date:
January 26, 2012
Applicant:
L'Air Liquide Societe Anonyme pour l'Etude et l- l'Exploitation des Procedes Georges Claude