Patents Assigned to L'Etat Francais represente par le Ministre des Postes, des Telecommunications et de l'Espace (C.N.E.T.)
  • Process for the anisotropic etching of a III-V material and application to the surface treatment for epitaxial growth
    Patent number: 5074955
    Abstract: Process for the anisotropic etching of a III-V material and application to surface treatment for epitaxial growth.This process includes the step of etching a III-V material (2) by reactive ionic etching using a gaseous mixture containing by volume 20 to 30% of at least one gaseous hydrocarbon, 30 to 50% of at least one inert gas and 20 to 50% of hydrogen.Said etching can be performed locally with the aid of a Si.sub.3 N.sub.4 etching mask (4a).
    Type: Grant
    Filed: August 17, 1990
    Date of Patent: December 24, 1991
    Assignee: L'Etat Francais represente par le Ministre des Postes, des Telecommunications et de l'Espace (C.N.E.T.)
    Inventors: Loic Henry, Claude Vaudry