Patents Assigned to Labotec Limited
  • Deposition device and deposition method
    Patent number: 9453278
    Abstract: A deposition device that deposits material particles includes an ionization section that ionizes the material particles utilizing a photoelectric effect in a reaction chamber to which the material particles are supplied, and an electrode section that guides the ionized material particles to a given area utilizing a Coulomb force.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: September 27, 2016
    Assignee: Labotec Limited
    Inventor: Hirofumi Nakano