Abstract: An apparatus, system, and method for generating a targeted electromagnetic pulse is presented. The apparatus includes a plasma generation apparatus including a housing element, a plasma reaction chamber, multiple electrode rings, and a power supply. The plasma reaction chamber is defined by an inner surface of the housing element and is configured to generate an electromagnetic field. Multiple electrode rings are disposed within the plasma reaction chamber to form an arc path. The power supply is coupled to the outer surface of the housing element to produce an electromagnetic pulse. The power supply includes primary coils, a secondary coil wound about the primary coils, and a coil core. A catalyst injection collar is coupled to the plasma generation apparatus and configured to direct a catalyst material into the plasma reaction chamber to amplify the electromagnetic pulse.

Abstract: A plasma generation apparatus, system, and method for processing a material is presented. The apparatus includes a housing element, a plasma reaction chamber, multiple electrode rings, and a power supply. The housing element extends cylindrically along a longitudinal axis. The plasma reaction chamber is defined by an inner surface of the housing element and is configured to generate an ionized plasma field. Multiple electrode rings are disposed within the plasma reaction chamber. Each of the electrode rings includes multiple electrodes such that the electrode rings form an arc path within the plasma reaction chamber. A power supply is coupled to the outer surface of the housing element. The power supply includes a plurality of primary coils and a secondary coil wound about the primary coils. A coil core is in contact with at least a portion of each of the primary coils.