Abstract: An excimer laser including a gas reservoir in which gas discharge is effected with the participation of halogen gas, comprises a collecting receptacle which communicates both with the gas reservoir and a halogen gas supply through conduits provided with shutoff valves. This apparatus is suitable for carrying out a method of refilling the gas reservoir of the excimer laser with halogen gas even if the pressure of the halogen gas supply is low and its volume restricted.
Type:
Grant
Filed:
March 1, 1993
Date of Patent:
March 7, 1995
Assignee:
Lamba Physik Gesellschaft zur Herstelling von Lasern mbH