Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
Type:
Grant
Filed:
June 12, 2003
Date of Patent:
October 31, 2006
Assignee:
Laser Photonics Technology Inc.
Inventors:
Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka
Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
Type:
Grant
Filed:
October 12, 1999
Date of Patent:
February 5, 2002
Assignee:
Laser Photonics Technology Inc.
Inventors:
Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka