Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.

Abstract: A photosensitive lithographic printing plate includes a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.

Abstract: A heat-sensitive composition which forms an image without the removal of material, which does not require any developing treatment after the stage of exposure to heat and comprises: (a) a switchable polymer, (b) an IR absorber, (c) a triazine compound, and (d) a novolak resin. Negative lithographic plate comprising a substrate coated with the said composition. A method for obtaining a negative image on a substrate coated with a composition which is first hydrophobic and then lipophilic after exposure to heat, without the removal of material, the said negative image being obtained by applying a small quantity of energy to the said composition.

Abstract: A heat-sensitive composition which forms an image without the removal of material, which does not require any developing treatment after the stage of exposure to heat and comprises: (a) a switchable polymer, (b) an IR absorber, (c) a triazine compound, and (d) a novolak resin. Negative lithographic plate comprising a substrate coated with the said composition. A method for obtaining a negative image on a substrate coated with a composition which is first hydrophilic and then lipophilic after exposure to heat, without the removal of material, the said negative image being obtained by applying a small quantity of energy to the said composition.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.

Abstract: A method for forming an image, which comprises subjecting a photosensitive layer of a photosensitive lithographic printing plate having a photosensitive layer comprising a photopolymerizable composition formed on a support surface to scanning exposure with a laser light having a wavelength in a range of from 650 to 1,300 nm, developing an image, and then further subjecting the photosensitive lithographic printing plate having the developed image to whole image exposure with a light exposure energy of from 1 to 70 times larger than the light exposure energy at the time of the laser light scanning exposure.

Abstract: A method for forming an image, which comprises subjecting a photosensitive layer of a photosensitive lithographic printing plate having a photosensitive layer comprising a photopolymerizable composition formed on a support surface to scanning exposure with a laser light having a wavelength in a range of from 650 to 1,300 nm, developing an image, and then further subjecting the photosensitive lithographic printing plate having the developed image to whole image exposure with a light exposure energy of from 1 to 70 times larger than the light exposure energy at the time of the laser light scanning exposure.

Abstract: A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 ?m.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 &mgr;J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450≦0.1.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 &mgr;J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450<0.1.

Abstract: A heat-sensitive composition of the positive type comprising a polymeric binder and a solubility inhibitor, wherein the said solubility inhibitor consists of an organometallic compound, with the exclusion of the metallocenes, an organic salt or an organic complex of an inorganic salt of a metal belonging to the group IIIA or transition group of the periodic system of the elements.

Abstract: A heat-sensitive composition of the positive type comprising a polymeric binder and a solubility inhibitor, wherein the said solubility inhibitor is a hydroxylated acrylic polymer, a hydroxylated acrylic copolymer or of a derivative thereof wherein some hydroxyl groups have been esterified by a carboxylic acid or a reactive derivative thereof.

Abstract: An IR- and UV-radiation-sensitive composition comprising a diazo resin, a diazo ester, at least one novolac resin and an IR-ray absorber. A lithographic plate comprising a support coated with the said photosensitive composition.