Abstract: An indium oxide/tin oxide powder with 5-15 wt. % tin oxide is subjected to an annealing treatment at T≧1, 000° C. and is then partially reduced and subjected to hot isostatic pressing to produce a sputtering target with a density of at least 95% of the theoretical density and a thermal conductivity of at least 14 Wm−1K−1.
Type:
Grant
Filed:
November 3, 1997
Date of Patent:
February 13, 2001
Assignee:
Leybold Material GmbH
Inventors:
Martin Schlott, Wolfgang Dauth, Martin Kutzner, Bruce Gehman, Shawn Vahlstrom