Patents Assigned to LF Chem, Ltd.
  • Patent number: 7556910
    Abstract: The present invention relates to a photosensitive composition comprising a triazine-based photoactive compound containing oxime ester. The photosensitive composition according to the present invention has good sensitivity, retention rate, mechanical strength, heat resistance, chemical resistance and developing durability since it contains, as photopolymerization initiator, a compound having an oxime ester group and a triazine group in one molecule and thus effectively absorbs UV radiation. Therefore, the photosensitive composition according to the present invention is advantageous not only in curing of materials for color filters, resin black matrixes, column spacers, overcoats and passivation films of liquid crystal displays, but also in high temperature process characteristics.
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: July 7, 2009
    Assignee: LF Chem, Ltd.
    Inventors: Sung Hyun Kim, Kyung Jun Kim, Dong Chang Choi, Jeong Ae Yoon, Hee Kwan Park, Geun Young Cha, Keon Woo Lee, Il Eok Kwon, Dong Kung Oh, Jong Hyun Park, Xiang Li Li, Han Soo Kim, Min Young Lim, Chang Ho Cho