Abstract: The present invention provides a reflective type liquid crystal display device and fabricating method thereof, by which resolution is enhanced in a manner of representing two colors from one sub-pixel. The present invention includes a first substrate having a plurality of thin film transistors and a plurality of pixel electrodes within a plurality of sub-pixels defined by a plurality of gate and data lines perpendicularly crossing with each other, respectively, a second substrate assembled to the first substrate to confront, a liquid crystal layer between the first and second substrates, a third substrate assembled to the first substrate to confront, a plurality of reflective electrodes on an inside of the third substrate to correspond to a plurality of the sub-pixels, respectively, and a color filter layer having a plurality of electrophoretic bodies on a plurality of the reflective electrodes wherein each of the electrophoretic bodies is micro-encapsulated with ionic pigment particles.

Abstract: A liquid crystal display device and a method of fabricating the same are disclosed in the present invention. The liquid crystal display device includes first and second substrates facing into each other, a sealant outside a liquid crystal display panel region between the first and second substrates, a first column spacer surrounded by the sealant, and a liquid crystal layer between the first and second substrates.

Abstract: A method for fabricating a liquid crystal display device includes: forming a pixel electrode on a substrate; forming a first conductive layer on the pixel electrode; forming a first photoresist pattern on the conductive layer; forming a source electrode forming portion, a channel forming portion and a pixel electrode forming portion using the first photoresist pattern as a mask; forming a semiconductor layer over an entire surface of the substrate; forming an insulating layer on the semiconductor layer; forming a second conductive layer on the insulating layer; forming a second photoresist pattern on the second conductive layer; forming an active layer using the second photoresist pattern; and forming a gate electrode on the active layer.