Abstract: A VCSEL structure is provided. The VCSEL structure comprises a substrate. The structure may also include one or more conducting layers positioned on the substrate. There may be void spaces positioned between portions of the conducting layers to electrically isolate the portions. A method for fabricating the VCSEL structure is also provided.

Abstract: Devices utilize elements carried by a fluid in a microchannel to switch, attenuate, shutter, filter, or phase shift optical signals. In certain embodiments, a microchannel carries a gaseous or liquid slug that interacts with at least a portion of the optical power of an optical signal traveling through a waveguide. The microchannel may form part of the cladding of the waveguide, part of the core and the cladding, or part of the core only. The microchannel may also have ends or may be configured as a loop or continuous channel. The fluid devices may be self-latching or may be semi-latching. The fluid in the microchannel is moved using e.g., e.g., electrocapillarity, differential-pressure electrocapillarity, electrowetting, continuous electrowetting, electrophoresis, electroosmosis, dielectrophoresis, electro-hydrodynamic electrohydrodynamic pumping, magneto-hydrodynamic magnetohydrodynamic pumping, thermocapillarity, thermal expansion, dielectric pumping, and/or variable dielectric pumping.

Abstract: Devices utilize elements carried by a fluid in a microchannel to switch, attenuate, shutter, filter, or phase shift optical signals. In certain embodiments, a microchannel carries a gaseous or liquid slug that interacts with at least a portion of the optical power of an optical signal traveling through a waveguide. The microchannel may form part of the cladding of the waveguide, part of the core and the cladding, or part of the core only. The microchannel may also have ends or may be configured as a loop or continuous channel. The fluid devices may be self-latching or may be semi-latching. The fluid in the microchannel is moved using e.g., e.g., electrocapillarity, differential-pressure electrocapillarity, electrowetting, continuous electrowetting, electrophoresis, electroosmosis, dielectrophoresis, electro-hydrodynamic electrohydrodynamic pumping, magneto-hydrodynamic magnetohydrodynamic pumping, thermocapillarity, thermal expansion, dielectric pumping, and/or variable dielectric pumping.

Abstract: The present invention provides an arrayed waveguide such that each waveguide of the grating has a substantially uniform width, but the width of any single waveguide in the grating is selected based on a predetermined birefringence required for the waveguide. Generally, the narrowest grating waveguide has the longest overall length and the widest grating waveguide has the shortest overall length. The remaining intermediate waveguides have widths that are interpolated between the narrowest and widest waveguide gratings. With an appropriate width for each waveguide, an arrayed waveguide grating is provided that has low polarization dependent wavelength.

Abstract: A method of making an optical waveguide structure having improved thermal isolation and stress reduction. The method etches both deep trenches and shallow trenches in a single step. The method includes the step of depositing a partial top clad layer over a first and second waveguide core. An etch back is then performed on the partial top clad layer to obtain a desired thickness of the partial top clad layer. A first hard mask layer is subsequently deposited over the partial top clad layer. A set of hard masks are then formed over the first and second waveguide cores by patterning and etching the first hard mask layer. A full top clad layer is then deposited over the partial top clad layer and the set hard masks to form a top clad. A second hard mask layer is then deposited over the top clad. A deep trench area and first and second shallow trench areas are then exposed by patterning and etching the second hard mask layer.

Abstract: A method of making a polarization insensitive optical waveguide structure. An optical core layer is formed on a substrate, wherein the optical core layer has a higher refractive index than the substrate. A mask is formed over the optical core layer. The unmasked areas of the optical core layer are then over-etched to define the core, wherein the over-etching removes the unmasked area of the optical core layer and a portion of the substrate disposed beneath the unmasked area, and defines the optical core. The mask is subsequently removed from the optical core. A cladding layer is then formed over the optical core and the substrate, the cladding layer having a lower refractive index than the optical core, to form a polarization insensitive optical waveguide structure. The amount of over-etching can be controlled to control an amount of substrate disposed beneath the unmasked area of the optical core layer that is removed.