Patents Assigned to Liquid Solutions LLC
  • Publication number: 20080272506
    Abstract: A submerged gas processor in the form of an evaporator or a submerged gas reactor includes a vessel, a gas delivery tube partially disposed within the vessel to deliver a gas into the vessel and a process fluid inlet that provides a process fluid to the vessel at a rate sufficient to maintain a controlled constant level of fluid within the vessel. A weir is disposed within the vessel adjacent the gas delivery tube to form a first fluid circulation path between a first weir end and a wall of the vessel and a second fluid circulation path between a second weir end and an upper end of the vessel. During operation, gas introduced through the tube mixes with the process fluid and the combined gas and fluid flow at a high rate with a high degree of turbulence along the first and second circulation paths defined around the weir, thereby promoting vigorous mixing and intimate contact between the gas and the process fluid.
    Type: Application
    Filed: July 1, 2008
    Publication date: November 6, 2008
    Applicant: LIQUID SOLUTIONS LLC
    Inventors: Bernard F. Duesel, John P. Gibbons, Michael J. Rutsch
  • Publication number: 20080265446
    Abstract: A submerged gas processor in the form of an evaporator or a submerged gas reactor includes a vessel, a gas delivery tube partially disposed within the vessel to deliver a gas into the vessel and a process fluid inlet that provides a process fluid to the vessel at a rate sufficient to maintain a controlled constant level of fluid within the vessel. A weir is disposed within the vessel adjacent the gas delivery tube to form a first fluid circulation path between a first weir end and a wall of the vessel and a second fluid circulation path between a second weir end and an upper end of the vessel. During operation, gas introduced through the tube mixes with the process fluid and the combined gas and fluid flow at a high rate with a high degree of turbulence along the first and second circulation paths defined around the weir, thereby promoting vigorous mixing and intimate contact between the gas and the process fluid.
    Type: Application
    Filed: July 1, 2008
    Publication date: October 30, 2008
    Applicant: LIQUID SOLUTIONS LLC
    Inventors: Bernard F. Duesel, John P. Gibbons, Michael J. Rutsch
  • Patent number: 7416172
    Abstract: A submerged gas processor in the form of an evaporator or a submerged gas reactor includes a vessel, a gas delivery tube partially disposed within the vessel to deliver a gas into the vessel and a process fluid inlet that provides a process fluid to the vessel at a rate sufficient to maintain a controlled constant level of fluid within the vessel. A weir is disposed within the vessel adjacent the gas delivery tube to form a first fluid circulation path between a first weir end and a wall of the vessel and a second fluid circulation path between a second weir end and an upper end of the vessel. During operation, gas introduced through the tube mixes with the process fluid and the combined gas and fluid flow at a high rate with a high degree of turbulence along the first and second circulation paths defined around the weir, thereby promoting vigorous mixing and intimate contact between the gas and the process fluid.
    Type: Grant
    Filed: July 21, 2005
    Date of Patent: August 26, 2008
    Assignee: Liquid Solutions LLC
    Inventors: Bernard F. Duesel, Jr., John P. Gibbons, Michael J. Rutsch