Patents Assigned to Litek Opto-Electronics Co., Ltd.
  • Patent number: 6719930
    Abstract: A production method of a light guide and a stamper, combining anisotropic etching and isotropic etching. First a plurality of microstructures is formed on a back surface and a front surface of the substrate. By electroforming, rear and front stampers are made from the back and front surfaces of the substrate. Light guides are produced using the rear and front stampers. Anisotropic etching is performed on the front surface of the substrate, forming V-shaped, U-shaped or pyramid like microstructures. Isotropic etching is performed on the back surface of the substrate, forming quadratic, bowl like, oval or semicircular microstructures. If a transparent substrate is used, then after finishing the etching of microstructures, a light source, a reflector, a diffusion sheet and a prism sheet are added, simulating a back light module for performing a test of luminosity, uniformity of light intensity and light emission angle, so that optical properties are known before proceeding with inverse-forming of the stampers.
    Type: Grant
    Filed: July 24, 2001
    Date of Patent: April 13, 2004
    Assignee: Litek Opto-Electronics Co., Ltd.
    Inventors: Shih-Chou Chen, Chung-Kuang Hsieh, Chih-Han Fang, Yuh-Sheng Lin