Abstract: A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
Type:
Grant
Filed:
October 22, 2018
Date of Patent:
December 10, 2019
Assignee:
Lithoptek LLC
Inventors:
Mark Schattenburg, Rudolf Hendel, John Glenn
Abstract: A method and apparatus in which retroreflective materials and surfaces are used for determining the position, orientation and scale of work pieces in order to accurately place process beams thereon for the purpose of surface patterning or treatment.
Type:
Grant
Filed:
January 24, 2017
Date of Patent:
December 4, 2018
Assignee:
Lithoptek LLC
Inventors:
Mark Schattenburg, Rudolf Hendel, Paul Glenn, John Glenn
Abstract: A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
Type:
Grant
Filed:
August 31, 2016
Date of Patent:
October 23, 2018
Assignee:
Lithoptek LLC
Inventors:
Mark Schattenburg, Rudolf Hendel, John Glenn
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