Abstract: One semiconductor device includes one parallel transistor for connecting in parallel multiple vertical transistors disposed in an active region on a semiconductor substrate. The parallel transistor includes semiconductor pillars that project out in a direction perpendicular to a main surface of the semiconductor substrate; a lower diffusion layer that is disposed below the semiconductor pillars; upper diffusion layers that are each disposed on an upper section of the semiconductor pillars; and gate electrodes disposed, with a gate insulator film therebetween, on the entire side surfaces of the semiconductor pillars. The upper diffusion layers are connected to one upper contact plug that is disposed over the upper diffusion layers.

Abstract: To provide an electrical fuse that is connected to a detection node via a selective transistor, a precharge transistor that precharges the detection node in a state where the selective transistor is off; a bias transistor that passes a bias current to the detection node in a state where the selective transistor is on and the precharge transistor is off, and a detection circuit that detects a potential of the detection node in a state where the bias current is flowing into the detection node, wherein the bias transistor reduces an amount of the bias current in a stepwise manner or a continuous manner.

Abstract: A semiconductor device is equipped with memory cells which are provided at the intersections of word lines and local bit lines, hierarchical switches which are respectively connected between the local bit lines and a global bit line, and a hierarchical sense amplifier which amplifies a potential difference generated between signal nodes, with the signal nodes being respectively connected to the local bit lines. According to the present invention, because the hierarchical sense amplifier is a differential type circuit, a stable sensing operation can be performed. In addition, because one hierarchical sense amplifier can be assigned to multiple local bit lines, the number of hierarchical sense amplifiers can be reduced.

Abstract: One semiconductor device includes a clock signal buffer circuit which, in response to activation of a chip selection signal (CS_n), starts generation of an internal clock signal PCLKAR, and internal circuits which operate in synchronization with the internal clock signal PCLKAR. The clock signal buffer circuit suspends generation of the internal clock signal PCLKAR at a second timing if command signals (CA0 to CA9) indicate read commands, and suspends generation of the internal clock signal PCLKAR at a first timing which is earlier than the second timing if the command signals (CA0 to CA9) indicate active commands. According to one embodiment, an internal clock signal is generated only for periods necessary in accordance with external command signals.

Abstract: Disclosed herein is a device that includes an internal circuit, a first terminal supplied with a first voltage, a first power-supply line coupled between the first terminal and the internal circuit, a potential monitoring terminal, and a first switch coupled between the internal power-supply line and the potential monitoring terminal.

Abstract: A semiconductor device is disclosed in which there are provided a first substrate including memory cells and at least one bit line electrically coupled to the memory cells, and a second substrate including a sense amplifier. Each of the memory cells includes a first transistor, and the sense amplifier includes a second transistor. The second substrate is stacked with the first substrate such that the sense amplifier amplifies data transferred through the bit line from a selected one of the memory cells. The first transistor is lower in carrier mobility than the second transistor.

Abstract: In The semiconductor device, a semiconductor substrate has first and second surfaces. A circuitry layer is formed over the first surface and a first insulating layer is further formed over the circuitry layer. A second insulating layer including a first insulating element is formed over the second surface. A third insulating layer including a second insulating element different from the first insulating element of the second insulating layer is formed over the second surface with an intervention of the second insulating layer therebetween. A penetration electrode penetrates through the semiconductor substrate, the circuitry layer, the first insulating layer, the second insulating layer and the third insulating layer.

Abstract: A method of layout of pattern includes the following processes. A graphic data of a first wiring in a first area of a semiconductor wafer is extracted. The first area is a semiconductor chip forming area. The first area is surrounded by a scribed area of the semiconductor wafer. The first area includes a second area. The second area is bounded with the scribed area. The second area has a second distance from a boundary between the semiconductor chip forming area and the scribed area to an boundary between the first area and the second area. A first dummy pattern in the first area is laid out. The first dummy pattern has at least a first distance from the first wiring. A second dummy pattern in the second area is laid out. The second dummy pattern has at least the first distance from the first wiring. The second dummy pattern has at least a third distance from the first dummy pattern.

Abstract: A method of layout of pattern includes the following processes. A graphic data of a first wiring in a first area of a semiconductor wafer is extracted. The first area is a semiconductor chip forming area. The first area is surrounded by a scribed area of the semiconductor wafer. The first area includes a second area. The second area is bounded with the scribed area. The second area has a second distance from a boundary between the semiconductor chip forming area and the scribed area to an boundary between the first area and the second area. A first dummy pattern in the first area is laid out. The first dummy pattern has at least a first distance from the first wiring. A second dummy pattern in the second area is laid out. The second dummy pattern has at least the first distance from the first wiring. The second dummy pattern has at least a third distance from the first dummy pattern.

Abstract: In one device, a first space partitioned by first and second line patters is filled with a multilayer film that is composed of a first silicon film having a high impurity concentration relative to a standard plug impurity concentration and a second silicon film having a low impurity concentration relative to the standard plug impurity concentration, and is divided by forming a groove using a mask film on the side wall of the second line pattern. As a result, expansion of a seam, which is formed only on the second silicon film having a low impurity concentration, is suppressed. After that, an isolation insulating film is embedded in the groove and impurity diffusion is carried out by a heat treatment, so that divided plugs as a whole are made to have the standard plug impurity concentration.

Abstract: A semiconductor device may include, but is not limited to, a semiconductor substrate having a first gate groove; a first fin structure underneath the first gate groove; a first diffusion region in the semiconductor substrate, the first diffusion region covering an upper portion of a first side of the first gate groove; and a second diffusion region in the semiconductor substrate. The second diffusion region covers a second side of the first gate groove. The second diffusion region has a bottom which is deeper than a top of the first fin structure.

Abstract: In order to prevent the detachment of a film which is a constituent part of an interlayer-insulating film, and to prevent a decline in the device properties of a semiconductor device, a semiconductor device is provided with an interlayer-insulating film having, in this order, a carbon-containing silicon nitride (SiCN) film, a first silicon nitride film, and a silicon oxide film or a carbon-containing silicon oxide (SiOC) film.

Abstract: A device includes a semiconductor region surrounded with the isolation region and includes a first active region, a channel region and a second active region arranged in that order in a first direction. A first side portion of the first active region and a second side portion of the second active region faces each other across a top surface of the channel region in the first direction. A gate electrode covers the top surface and the first and second side portions and extends in a second direction that intersects the first direction. A first diffusion layer is formed in the first active region. A second diffusion layer is formed in the second active region. An embedded contact plug is formed in the first active region and extends downwardly from the upper surface of the semiconductor region and contacts with the first diffusion layer.

Abstract: There is provided a semiconductor memory device that includes: a plurality of memory mats each including a plurality of word lines, a plurality of bit lines, a plurality of memory cells each located at an intersection between the word line and the bit line, and at least one dummy word line not having connection to a dummy cell; a plurality of sense amplifier arrays located between adjacent memory mats, the sense amplifier arrays including a plurality of sense amplifiers including a pair of input/output nodes, one of which pair is connected to the bit lines of the adjacent memory mats on one side and the other of which pair is connected to the bit lines of the adjacent memory mats on the other side, respectively; and an activating unit which, in response to activation of the word line in a memory mat selected from the memory mats, activates the dummy word line in the memory mat adjacent to the selected memory mat.

Abstract: To provide a duty detection circuit including: a plurality of duty detectors that detect a duty ratio of internal clocks; a controller that controls the plurality of duty detectors so that the plurality of duty detectors operates in different phases from one another; and an output selecting unit that selects one of duty detection signals from the plurality of duty detectors. According to the present invention, since the duty detectors operate in the different phases from one another, the output selecting unit can output a duty detection signal with a higher frequency than a generation frequency with which each duty detector generates the duty detection signal. Accordingly, when the duty detection circuit according to the present invention is used to adjust a clock of the DLL circuit, a control period of the DLL circuit can be reduced.

Abstract: A charge pump circuit includes a first plurality of capacitors, and a first precharge circuit. The first plurality of capacitors are connected in parallel to each other. The first plurality of capacitors receive clock signals to perform sequentially pumping operations which generate a first higher voltage from a power voltage supplied. The first precharge circuit precharges a predetermined number of capacitors in the first plurality of capacitors at the power voltage. The predetermined number is greater than one.