Patents Assigned to LSR Engineering & Consulting Limited
  • Patent number: 11854829
    Abstract: A method for structuring a substrate is specified, in particular structuring by means of selective etching in the semiconductor and IC substrate industry, in which the following steps are carried out: providing a substrate, applying a titanium seed layer, full-area coating with a photoresist layer, lithographic structuring of the photoresist layer, in order to expose regions of the titanium seed layer, selectively depositing copper as conductor tracks in those areas in which the titanium seed layer is exposed, removing the structured photoresist, and etching the titanium seed layer in the areas previously covered by the structured photoresist, wherein phosphoric acid is used to etch the titanium seed layer and, in addition, exposure to UV light is carried out during the etching of the titanium.
    Type: Grant
    Filed: May 8, 2020
    Date of Patent: December 26, 2023
    Assignee: LSR Engineering & Consulting Limited
    Inventor: Marcus Elmar Lang
  • Publication number: 20220130680
    Abstract: A method for structuring a substrate is specified, in particular structuring by means of selective etching in the semiconductor and IC substrate industry, in which the following steps are carried out: providing a substrate, applying a titanium seed layer, full-area coating with a photoresist layer, lithographic structuring of the photoresist layer, in order to expose regions of the titanium seed layer, selectively depositing copper as conductor tracks in those areas in which the titanium seed layer is exposed, removing the structured photoresist, and etching the titanium seed layer in the areas previously covered by the structured photoresist, wherein phosphoric acid is used to etch the titanium seed layer and, in addition, exposure to UV light is carried out during the etching of the titanium.
    Type: Application
    Filed: May 8, 2020
    Publication date: April 28, 2022
    Applicant: LSR Engineering & Consulting Limited
    Inventor: Marcus Elmar LANG