Patents Assigned to Lumilant, Inc.
  • Publication number: 20160148963
    Abstract: Systems, devices, and methods for an extraordinary optical transmission (EOT) image capture system comprising optical components to capture light corresponding to an object, an EOT filter device to receive the captured light and transmit wavelengths of interest, and an image sensor to receive the wavelengths of interest and capture an image corresponding to the object. The EOT filter device comprising a first EOT film with thickness TEOT1 and including upper and lower surfaces and a plurality of apertures having a pitch P1, a second EOT film with thickness TEOT2 and including upper and lower surfaces and a plurality of apertures having a pitch P2; and an optical cavity disposed between the first and second EOT films, the optical cavity having a thickness TOC and a refractive index RIOC, wherein the EOT filter device transmits wavelengths of interest based on thicknesses TEOT1 and TEOT2, pitches P1 and P2, and thickness TOC.
    Type: Application
    Filed: November 23, 2015
    Publication date: May 26, 2016
    Applicant: Lumilant, Inc.
    Inventors: Timothy Creazzo, Mathew Zablocki
  • Publication number: 20130140723
    Abstract: According to embodiments of the invention, the design and fabrication of a binary superimposed grating (BSG) results in better performing devices that may be fabricated using existing technology. The fabrication process includes forming grating features based upon repeating features of the desired superposition function. The design process also relaxes the processing requirement for equivalently performing devices.
    Type: Application
    Filed: September 7, 2012
    Publication date: June 6, 2013
    Applicant: Lumilant, Inc.
    Inventors: Janusz Murakowski, Shouyuan Shi, Dennis W. Prather
  • Patent number: 8338268
    Abstract: A transfer process for silicon nanomembranes (SiNM) may involve treating a recipient substrate with a polymer structural support. After treating the recipient substrate, a substrate containing the intended transferable devices may be brought in direct contact with the aforementioned polymer layer. The two substrates may then go through a Deep Reactive Ion Etch (DRIE) to remove at least a portion of the substrate containing the devices. Oxide may be selectively removed with a buffered oxide wet etch, leaving the transferred SiNM on the recipient substrate with the Underlying polymer layer.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: December 25, 2012
    Assignee: Lumilant, Inc.
    Inventors: Mathew Joseph Zablocki, Ahmed Sharkawy, Dennis W. Prather
  • Publication number: 20120257851
    Abstract: An optical logic gate may be composed of a host material having air holes disposed therein and having parallel optical waveguides formed therein.
    Type: Application
    Filed: March 6, 2012
    Publication date: October 11, 2012
    Applicant: Lumilant, Inc.
    Inventors: Ahmed Sharkawy, Mathew J. Zablocki, Dennis W. Prather