Abstract: Systems, devices, and methods for an extraordinary optical transmission (EOT) image capture system comprising optical components to capture light corresponding to an object, an EOT filter device to receive the captured light and transmit wavelengths of interest, and an image sensor to receive the wavelengths of interest and capture an image corresponding to the object. The EOT filter device comprising a first EOT film with thickness TEOT1 and including upper and lower surfaces and a plurality of apertures having a pitch P1, a second EOT film with thickness TEOT2 and including upper and lower surfaces and a plurality of apertures having a pitch P2; and an optical cavity disposed between the first and second EOT films, the optical cavity having a thickness TOC and a refractive index RIOC, wherein the EOT filter device transmits wavelengths of interest based on thicknesses TEOT1 and TEOT2, pitches P1 and P2, and thickness TOC.
Abstract: According to embodiments of the invention, the design and fabrication of a binary superimposed grating (BSG) results in better performing devices that may be fabricated using existing technology. The fabrication process includes forming grating features based upon repeating features of the desired superposition function. The design process also relaxes the processing requirement for equivalently performing devices.
Type:
Application
Filed:
September 7, 2012
Publication date:
June 6, 2013
Applicant:
Lumilant, Inc.
Inventors:
Janusz Murakowski, Shouyuan Shi, Dennis W. Prather
Abstract: A transfer process for silicon nanomembranes (SiNM) may involve treating a recipient substrate with a polymer structural support. After treating the recipient substrate, a substrate containing the intended transferable devices may be brought in direct contact with the aforementioned polymer layer. The two substrates may then go through a Deep Reactive Ion Etch (DRIE) to remove at least a portion of the substrate containing the devices. Oxide may be selectively removed with a buffered oxide wet etch, leaving the transferred SiNM on the recipient substrate with the Underlying polymer layer.
Type:
Grant
Filed:
March 17, 2011
Date of Patent:
December 25, 2012
Assignee:
Lumilant, Inc.
Inventors:
Mathew Joseph Zablocki, Ahmed Sharkawy, Dennis W. Prather
Abstract: An optical logic gate may be composed of a host material having air holes disposed therein and having parallel optical waveguides formed therein.
Type:
Application
Filed:
March 6, 2012
Publication date:
October 11, 2012
Applicant:
Lumilant, Inc.
Inventors:
Ahmed Sharkawy, Mathew J. Zablocki, Dennis W. Prather