Abstract: The blank mask according to one embodiment of the present disclosure comprises a transparent substrate and a multilayer light shielding film disposed on the transparent substrate. The multilayer light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The multilayer light shielding film comprises a first light shielding film and a second light shielding film disposed on the first light shielding film. The multilayer light shielding film comprises total nine parts that are formed by trisection in a width direction and a length direction of an upper surface of the multilayer light shielding film. Each part of the multilayer light shielding film comprises a measuring range disposed in a side thereof.
Type:
Grant
Filed:
November 4, 2022
Date of Patent:
June 9, 2026
Assignee:
LuminaMask Co., Ltd.
Inventors:
Min Gyo Jeong, Sung Hoon Son, Seong Yoon Kim, GeonGon Lee, Suk Young Choi, Hyung-joo Lee, Hahyeon Cho, Taewan Kim, Suhyeon Kim, Inkyun Shin
Abstract: The method of preparing a laminate includes: preparing a process target, which is a laminate before being processed, where a light-shielding film has been disposed; and preparing a cleaned laminate through a first cleaning including applying UV rays and carbonated water to the process target, wherein the light-shielding film includes a transition metal and an element selected from the group consisting of oxygen, nitrogen, and carbon.
Type:
Grant
Filed:
December 13, 2022
Date of Patent:
June 9, 2026
Assignee:
LuminaMask Co., Ltd.
Inventors:
Taewan Kim, GeonGon Lee, Suk Young Choi, Hyung-joo Lee, Suhyeon Kim, Sung Hoon Son, Seong Yoon Kim, Min Gyo Jeong, HaHyeon Cho, Inkyun Shin