Patents Assigned to LuminaMask Co., Ltd.
  • Patent number: 12650640
    Abstract: The blank mask according to one embodiment of the present disclosure comprises a transparent substrate and a multilayer light shielding film disposed on the transparent substrate. The multilayer light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The multilayer light shielding film comprises a first light shielding film and a second light shielding film disposed on the first light shielding film. The multilayer light shielding film comprises total nine parts that are formed by trisection in a width direction and a length direction of an upper surface of the multilayer light shielding film. Each part of the multilayer light shielding film comprises a measuring range disposed in a side thereof.
    Type: Grant
    Filed: November 4, 2022
    Date of Patent: June 9, 2026
    Assignee: LuminaMask Co., Ltd.
    Inventors: Min Gyo Jeong, Sung Hoon Son, Seong Yoon Kim, GeonGon Lee, Suk Young Choi, Hyung-joo Lee, Hahyeon Cho, Taewan Kim, Suhyeon Kim, Inkyun Shin
  • Patent number: 12649854
    Abstract: The method of preparing a laminate includes: preparing a process target, which is a laminate before being processed, where a light-shielding film has been disposed; and preparing a cleaned laminate through a first cleaning including applying UV rays and carbonated water to the process target, wherein the light-shielding film includes a transition metal and an element selected from the group consisting of oxygen, nitrogen, and carbon.
    Type: Grant
    Filed: December 13, 2022
    Date of Patent: June 9, 2026
    Assignee: LuminaMask Co., Ltd.
    Inventors: Taewan Kim, GeonGon Lee, Suk Young Choi, Hyung-joo Lee, Suhyeon Kim, Sung Hoon Son, Seong Yoon Kim, Min Gyo Jeong, HaHyeon Cho, Inkyun Shin