Patents Assigned to m&Circlesolid;FSI Ltd.
  • Substrate treatment process and apparatus
    Patent number: 6743301
    Abstract: A substrate treatment process is disclosed to remove organic matter existing on a substrate such as a wafer, glass substrate or ceramic. The process comprises treating the substrate with ozone water and then with hydrogen water, or treating the substrate with ozone-hydrogen water or treating the substrate with ozone water and hydrogen water at the same time.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: June 1, 2004
    Assignee: m&Circlesolid;FSI Ltd.
    Inventors: Kousaku Matsuno, Masao Iga