Abstract: A clean room is provided through which clean air/recirculated air flow, and which comprises at least one processing unit and/or processing surface to which is supplied a gaseous medium of known composition, wherein the gaseous medium can be supplied to the clean room separately.
Type:
Grant
Filed:
August 5, 1999
Date of Patent:
October 23, 2001
Assignee:
M+W Zander Facility Engineering GmbH & Co.
KG