Patents Assigned to MACRONIX Industrial Co., Ltd.
  • APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE
    Publication number: 20090299668
    Abstract: An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.
    Type: Application
    Filed: August 12, 2009
    Publication date: December 3, 2009
    Applicant: MACRONIX Industrial Co., Ltd.
    Inventors: Tuung Luoh, Sheng-Hui Hsieh, Shing-Ann Luo, Chin-Ta Su, Ta-Hung Yang, Kuang-Chao Chen