Patents Assigned to MACROTECH TECHNOLOGY INC.
  • Publication number: 20150091154
    Abstract: Disclosed is a substrateless semiconductor package having a plurality of scribe lines formed on a heat spreader, primarily comprising the heat spreader, a chip disposed on the heat spreader and an encapsulant. Formed on a thermally dissipating surface of the heat spreader are a plurality of scribe line grooves with a plurality of openings formed inside to penetrate through the die-attaching surface of the heat spreader. The chip is disposed on the die-attaching surface and the encapsulant is formed on the die-attaching surface to encapsulate a first surface of the chip on which a plurality of external pads are formed Without being covered by the encapsulant. Therein, the encapsulant is filled in the scribe line grooves via the openings so that a scribe line pattern exposed from the thermally dissipating surface is formed.
    Type: Application
    Filed: September 30, 2013
    Publication date: April 2, 2015
    Applicants: Macrotech Technology Inc., Powertech Technology Inc.
    Inventor: Hung-Hsin HSU
  • Publication number: 20150048496
    Abstract: Disclosed is a fabrication process of fabricating bumps aligned on TSVs on chip backside. A plurality of TSV pillars are embedded inside the semiconductor layer of an IC substrate where the sidewalls the bottom of the TSV pillars toward the chip backside are covered by a dielectric liner. Then, the thickness of the semiconductor layer is reduced from the chip backside to make the bottom portion of the dielectric liner to be exposed from the chip backside by including a first selectively etching. Then, a backside passivation is disposed on the chip backside without disposing on the bottoms of the TSV pillars. Then, the bottom portion of the dielectric liner is removed by a second selectively etching. An UBM layer is disposed on the backside passivation. A plurality of bumps are disposed on the UBM layer where the interface between each bump and each TSV pillar is a central protrusion lumped toward the corresponding bump.
    Type: Application
    Filed: August 13, 2013
    Publication date: February 19, 2015
    Applicants: MACROTECH TECHNOLOGY INC., POWERTECH TECHNOLOGY INC.
    Inventors: Chao-Shun CHIU, Yen-Chu CHEN
  • Publication number: 20150048499
    Abstract: Disclosed is a fine-pitch pillar bump layout structure on chip, comprising a chip, a passivation layer and at least two pillar bumps. Bonding pads of the chip are disposed along an X-axis. Openings of the passivation layer have a first aspect ratio. Pillar bumps are disposed on the bonding pads and each has a pillar body and a solder cap. Each pillar body has a plurality of symmetrical raised blocks disposed on the passivation layer and extended in both directions of Y-axis. The pillar bodies have shrunk bump widths along the X-axis so that a second aspect ratio is at least 1.5 times greater than the first aspect ratio and to partially expose the bonding pads and to make the central points of the pillar bodies be vertically aligned with the central points of the openings of the passivation layer.
    Type: Application
    Filed: August 16, 2013
    Publication date: February 19, 2015
    Applicants: MACROTECH TECHNOLOGY INC., POWERTECH TECHNOLOGY INC.
    Inventors: Kuo-Jui TAI, Li-Jen LIN, Shou-Chian HSU