Patents Assigned to Makoto Takahashi
  • METHOD FOR THE FORMATION OF RESIST PATTERNS
    Publication number: 20010001703
    Abstract: Method for the formation of resist patterns by using a chemically amplified resist which comprises an alkali-insoluble base polymer or copolymer and an acid generator, in which the patternwise exposed film of said resist is developed with an organic alkaline developer in the presence of a surface active agent containing a higher alkyl group in a molecule thereof. The resist patterns have no drawback such as cracks and peeling, and thus can be advantageously used in the production of semiconductor devices such as LSIs and VLSIs.
    Type: Application
    Filed: March 5, 1997
    Publication date: May 24, 2001
    Applicant: Makoto Takahashi
    Inventors: MAKOTO TAKAHASHI, SATOSHI TAKECHI