Patents Assigned to Mallinckrodt Baker, Inc.
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Patent number: 7825078Abstract: Back end photoresist strippers and residue compositions are provided by non-aqueous compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise a polar organic solvent, a hydroxylated amine, and as a corrosion inhibitor fructose.Type: GrantFiled: February 1, 2005Date of Patent: November 2, 2010Assignee: Mallinckrodt Baker, Inc.Inventor: Seiji Inaoka
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Patent number: 7799749Abstract: Non-aqueous stripping and cleaning compositions for cleaning microelectronics devices, the composition having a least one organic sulfur-containing polar compound as a stripping solvent, at least one water-free source of a strong hydroxide base, and at least one hydroxypyridine stabilizing agent to inhibit detrimental side reactions.Type: GrantFiled: January 31, 2007Date of Patent: September 21, 2010Assignee: Mallinckrodt Baker, Inc.Inventor: Sean M. Kane
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Patent number: 7767636Abstract: Nanoelectronic and microelectronic cleaning corn positions for cleaning nanoelectronic and microelectronic substrates under supercritical fluid state conditions, and particularly cleaning compositions useful with and having improved compatibility with nanoelectronic and microelectronic substrates characterized by silicon dioxide, sensitive low-n or high-K dielectrics and copper, tungsten, tantalum, nickel, gold, cobalt, palladium, platinum, chromium, ruthenium, rhodium, iridium, hafnium, titanium, molybdenum, tin and other metallization, as well as substrates of A1 or Al(Cu) metallizations and advanced interconnect technologies, are provided by nanoelectronic and microelectronic cleaning compositions.Type: GrantFiled: February 11, 2005Date of Patent: August 3, 2010Assignee: Mallinckrodt Baker, Inc.Inventor: Chien-Pin Sherman Hsu
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Patent number: 7754668Abstract: The invention provides cleaning compositions for cleaning microelectronic substrates that are able to essentially completely clean such substrates and inhibit metal corrosion or produce essentially no corrosion of the metal elements of such substrates, and to do so at relatively short cleaning times and relatively low temperatures compared to the cleaning times required for prior art alkaline-containing cleaning compositions. The invention also provides method of using such cleaning compositions to clean microelectronic substrates without producing any significant corrosion of the metal elements of the microelectronic substrate. The cleaning compositions of this invention comprise (a) at least one organic solvent, (b) at least one unneutralized inorganic phosphorus-containing acid, and (c) water. The cleaning compositions of this invention optionally can have present in the compositions other components, such as for example surfactants, metal complexing or chelating agents, corrosion inhibitors, and the like.Type: GrantFiled: April 18, 2006Date of Patent: July 13, 2010Assignee: Mallinckrodt Baker. IncInventor: Sean M. Kane
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Patent number: 7718591Abstract: Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by sensitive porous and low-? to high-? dielectrics and copper metallization. The cleaning composition contain one or more non-ammonium producing, non-HF producing fluoride salt (non ammonium, quaternary ammonium fluoride salt) in a suitable solvent matrix.Type: GrantFiled: June 13, 2007Date of Patent: May 18, 2010Assignee: Mallinckrodt Baker, Inc.Inventor: Chien-Pin S. Hsu
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Publication number: 20100055180Abstract: An improved excipient comprising substantially homogeneous particles of a compressible, high functionality granular microcrystalline cellulose based excipient is provided. The improved excipient comprises microcrystalline cellulose and a binder, and optionally a disintegrant, and is formed by spraying a homogeneous slurry of the components. The excipient provides enhanced flowability/good flow properties, excellent/high compactibility, and increased API loading and blendability as compared to the individual components, and as compared to conventional excipients formed from the same materials. The improved excipient has strong intraparticle bonding bridges between the components, resulting in a unique structural morphology including significant open structures or hollow pores. The presence of these pores provides a surface roughness that is the ideal environment for improved blending with an API.Type: ApplicationFiled: November 16, 2009Publication date: March 4, 2010Applicant: Mallinckrodt Baker, Inc.Inventors: Nandu Deorkar, James Farina, Liliana Miinea, Sameer Randive
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Patent number: 7671001Abstract: The invention provides alkaline compositions useful in the microelectronics industry for stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants. The compositions contain (a) one or more bases and (b) one or more metal corrosion inhibiting metal halides of the formula: WzMXy where M is a metal selected from the group Si, Ge, Sn, Pt, P, B, Au, Ir, Os, Cr, Ti, Zr, Rh, Ru, and Sb; X is a halide selected from F, Cl, Br and I; W is selected from H, to an alkali or alkaline earth metal, and a metal ion-free hydroxide base moiety; y is a numeral of from 4 to 6 depending on the metal halide; and z is a numeral of 1, 2 or 3.Type: GrantFiled: October 20, 2004Date of Patent: March 2, 2010Assignee: Mallinckrodt Baker, Inc.Inventor: David C. Skee
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Publication number: 20100012565Abstract: A low cost re-usable end-cap for disposable chromatographic columns or solid phase extraction cartridges that simultaneously provide sealing of the column and axial compression, and chromatography columns and solid phase extraction cartridges employing such re-usable end caps.Type: ApplicationFiled: September 23, 2009Publication date: January 21, 2010Applicant: Mallinckrodt Baker, Inc.Inventors: Nandu Deorkar, Paul A. Bouis
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Patent number: 7521406Abstract: Microelectronic cleaning compositions for cleaning microelectronic substrates, and particularly cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by silicon dioxide, sensitive low-? or high-? dielectrics and copper, tungsten, tantalum, nickel, gold, cobalt, palladium, platinum, chromium, ruthenium, rhodium, iridium, hafnium, titanium, molybdenum, tin and other metallization, as well as substrates of Al or Al(Cu) metallizations and advanced interconnect technologies, are provided by microelectronic cleaning compositions comprising halogen acids, salts and derivatives thereof.Type: GrantFiled: November 5, 2004Date of Patent: April 21, 2009Assignee: Mallinckrodt Baker, IncInventor: Chien-Pin Sherman Hsu
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Patent number: 7470767Abstract: Ultrapure olefinic polymeric articles of manufacture can be prepared by a process comprising: providing olefinic polymeric material containing impurities, subjecting the olefinic polymeric material to supercritical CO2 at a pressure of at least about 4000 psi (281.23 kg/cm2) at a temperature of from about 35° C. and above, to extract the impurities from the olefinic polymeric material and produce ultrapure olefinic polymeric material, and molding ultrapure articles of manufacture from the ultrapure, olefinic polymeric material.Type: GrantFiled: July 6, 2005Date of Patent: December 30, 2008Assignee: Mallinckrodt Baker, Inc.Inventors: Nandu Deorkar, Paul Bouis
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Patent number: 7419945Abstract: Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k dielectrics and copper or aluminum metallizations contain an oxidizing agent and a polar organic solvent selected from amides, sulfones, sulfolenes, selenones and saturated alcohols, and optionally other components.Type: GrantFiled: May 27, 2003Date of Patent: September 2, 2008Assignee: Mallinckrodt Baker, Inc.Inventor: Chien-Pin Sherman Hsu
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Patent number: 7393819Abstract: Ammonia-free cleaning compositions for cleaning microelectronic substrates, and particularly to such cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by sensitive porous, low-? and high-? dielectrics and copper metallization. Cleaning compositions for stripping photoresists, cleaning residues from plasma generated organic, organometallic and inorganic compounds, and cleaning residues from planarization processes. The cleaning composition contain one or more non-ammonium producing strong base containing non-nucleophilic, positively charged counter ions and one or more steric hindered amide solvents.Type: GrantFiled: July 8, 2002Date of Patent: July 1, 2008Assignee: Mallinckrodt Baker, Inc.Inventor: Chien-Pin Sherman Hsu
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Patent number: 7375188Abstract: The invention relates to methods of producing Protein A without contamination of the Protein A by animal products. The invention also relates to a vegetarian fermentation media in which Staphylococcus aureus is grown to produce a vegetarian Protein A. The invention further relates to a vegetarian Protein A and the use of a vegetarian Protein A in therapeutic and prophylactic methods.Type: GrantFiled: July 29, 2005Date of Patent: May 20, 2008Assignee: Mallinckrodt Baker, Inc.Inventors: Thomas Richard Leary, Daniel Lafoe
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Publication number: 20080103078Abstract: Back end photoresist strippers and cleaning compositions of this invention are provided by amino acid-free, non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent, at least one hydroxylated organic amine, and at least one corrosion inhibitor compound with multiple hydroxyl functional groups that is a compound of the formula: T1-[(CR1R2)m—(CR3R4)n]p—(CR5R6)q-T2 where at least one of R1 and R2 OH and if one of R1 and R2 is not OH, it is selected from H, alkyl or alkoxy, m is a whole integer of 1 or greater, R3 and R4 are selected from H, alkyl or alkoxy, n is 0 or a greater whole positive integer, p is a whole integer of 1 or greater; at least one of R5 and R6 is OH and if one of R5 and R6 is not OH, it is selected from H, alkyl or alkoxy, q is a whole integer of 1 or greater; T1 and T2 are selected from H, alkyl, hydroxyalkyl, polyhydroxyalkyl, aminoalkyl, carbonylalkyl or amide groups or T1 and T2 may be coType: ApplicationFiled: February 25, 2005Publication date: May 1, 2008Applicant: MALLINCKRODT BAKER, INC.Inventor: Seiji Inaoka
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Publication number: 20070249804Abstract: Ultrapure olefinic polymeric articles of manufacture can be prepared by a process comprising: providing olefinic polymeric material containing impurities, subjecting the olefinic polymeric material to supercritical CO2 at a pressure of at least about 4000 psi (281.23 kg/cm2) at a temperature of from about 35° C. and above, to extract the impurities from the olefinic polymeric material and produce ultrapure olefinic polymeric material, and molding ultrapure articles of manufacture from the ultrapure, olefinic polymeric material.Type: ApplicationFiled: July 6, 2005Publication date: October 25, 2007Applicants: MALLINCKRODT BAKER INC., MALLINCKRODT BAKER, INC.Inventors: Nandu Deorkar, Paul Bouis
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Publication number: 20070232513Abstract: Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by sensitive porous and low-? to high-? dielectrics and copper metallization. The cleaning composition contain one or more non-ammonium producing, non-HF producing fluoride salt (non ammonium, quaternary ammonium fluoride salt) in a suitable solvent matrix.Type: ApplicationFiled: June 13, 2007Publication date: October 4, 2007Applicant: Mallinckrodt Baker, IncInventor: Chien-Pin Hsu
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Patent number: 7247208Abstract: Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by sensitive porous and low-k to high-k dielectrics and copper metallization. The cleaning composition contain one or more non-ammonium producing, non-HF producing fluoride salt (non ammonium, quaternary ammonium fluoride salt) in a suitable solvent matrix.Type: GrantFiled: July 8, 2002Date of Patent: July 24, 2007Assignee: Mallinckrodt Baker, Inc.Inventor: Chien-Pin Sherman Hsu
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Patent number: 6749998Abstract: Alkaline photoresist stripping compositions containing a reducing agent to reduce or inhibit metal corrosion are disclosed. Reducing agents include compounds containing reactive multiple bonds, hydrazine and derivatives thereof, oximes, hydroquinone, pyrogallol, gallic acid and esters thereof, tocopherol, 6-hydroxy-2,5,7,8-tetramethylchroman-2-carboxylic acid, BHT, BHA, 2,6-di-tert-butyl-4-hydroxymethyl-phenol, thiols, salicylaldehyde, 4-hydroxybenzaldehyde and glycol aldehyde dialkylacetals.Type: GrantFiled: October 2, 2001Date of Patent: June 15, 2004Assignee: Mallinckrodt Baker Inc.Inventors: George Schwartzkopf, Geetha Surendran
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Publication number: 20020037479Abstract: Alkaline photoresist stripping compositions containing reducing agent to reduce or inhibit metal corrosion. Reducing agents include compounds containing reactive multiple bonds, hydrazine and derivatives thereof, oximes, hydroquinone, pyrogallol, gallic acid and esters thereof, tocopherol, 6-hydroxy-2,5,7,8-tetramethylchroman-2-carboxylic acid, BHT, BHA, 2,6-di-tert-butyl-4-hydroxymethyl-phenol, thiols, salicylaldehyde, 4-hydroxybenzaldehyde and glycol aldehyde dialkylacetals.Type: ApplicationFiled: October 2, 2001Publication date: March 28, 2002Applicant: Mallinckrodt Baker, Inc.Inventors: George Schwartzkopf, Geetha Surendran
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Patent number: 6326130Abstract: Alkaline photoresist stripping compositions containing reducing agent to reduce or inhibit metal corrosion. Reducing agents include compounds containing reactive multiple bonds, hydrazine and derivatives thereof, oximes, hydroquinone, pyrogallol, gallic acid and esters thereof, tocopherol, 6-hydroxy-2,5,7,8-tetramethylchroman-2-carboxylic acid, BHT, BHA, 2,6-di-tert-butyl-4-hydroxymethyl-phenol, thiols, salicylaldehyde, 4-hydroxybenzaldehyde and glycol aldehyde dialkylacetals.Type: GrantFiled: October 7, 1993Date of Patent: December 4, 2001Assignee: Mallinckrodt Baker, Inc.Inventors: George Schwartzkopf, Geetha Surendran