Patents Assigned to Man Fung Technologies, Inc.
  • Article and method for distress-washing fabric
    Patent number: 7950090
    Abstract: An article for distress-washing fabric comprising a hollow float and at least one distressing feature projecting outwardly from an outer surface of the float, wherein the article is substantially wear resistant and does not produce residue as a result of impact with fabric, internal surfaces of a washing machine and additional articles for distress-washing fabric. A method for distress-washing fabric utilizing an article described herein.
    Type: Grant
    Filed: January 7, 2009
    Date of Patent: May 31, 2011
    Assignee: Man Fung Technologies, Inc.
    Inventors: Kat Tsui, Eric Chi Shun Lee