Patents Assigned to MANFREDI
  • HIGH PRESSURE CLEANING
    Publication number: 20010041517
    Abstract: A method and apparatus for chemical mechanical polishing a semiconductor wafer by providing a novel high pressure mixture of gas and liquid in a pulsation mode for eliminating residual slurry, by-products, and slurry abrasive particles on or in the polishing pad.
    Type: Application
    Filed: August 10, 1999
    Publication date: November 15, 2001
    Applicant: MANFREDI
    Inventor: PAUL A. MANFREDI