Abstract: To provide an amorphous silicon forming composition, which has high affinity with a substrate, is excellent in filling properties, and is capable of forming a thick film. [Means for Solution] An amorphous silicon forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, wherein at least one silicon in the block A and at least one silicon in the block B are connected by a single bond and/or a crosslinking group comprising silicon, and (b) a solvent.
Type:
Grant
Filed:
November 26, 2019
Date of Patent:
September 17, 2024
Assignee:
Marck Patent GmbH
Inventors:
Naoko Nakamoto, Takashi Fujiwara, Atsuhiko Sato
Abstract: Compounds of the formula I in which R1, X and n have the meanings indicated in Claim 1, are inhibitors of Tankyrase, and can be employed, inter alia, for the treatment of diseases such as cancer, cardiovascular diseases, central nervous system injury and different forms of inflammation.
Type:
Grant
Filed:
May 30, 2014
Date of Patent:
September 5, 2017
Assignee:
Marck Patent GmbH
Inventors:
Hans-Peter Buchstaller, Dieter Dorsch, Christina Esdar, Birgitta Leuthner
Abstract: Compounds of the formula I in which R1, X and n have the meanings indicated in Claim 1, are inhibitors of Tankyrase, and can be employed, inter alia, for the treatment of diseases such as cancer, cardiovascular diseases, central nervous system injury and different forms of inflammation.
Type:
Application
Filed:
May 30, 2014
Publication date:
November 3, 2016
Applicant:
Marck Patent GmbH
Inventors:
Hans-Peter BUCHSTALLER, Dieter DORSCH, Christina ESDAR, Birgitta LEUTHNER