Patents Assigned to Masaru Okada
  • Method of producing ferroelectric thin film
    Patent number: 4792463
    Abstract: Method of producing a ferroelectric thin film by chemical vapor deposition, by providing a gaseous mixture containing oxygen and a gaseous raw material containing (A) alkyl lead and or alkyl bismuth together with an alcoholate of titanium, zirconium, silicon, germanium or niobium, (B) alkyl lead and alkyl germanium, or (C) alkyl bismuth and alkyl lead, and reacting the oxygen and gaseous raw material to oxidize the components of (A), (B) or (C), to form the thin film on the substrate.
    Type: Grant
    Filed: September 3, 1986
    Date of Patent: December 20, 1988
    Assignees: Masaru Okada, Horiba, Ltd.
    Inventors: Masaru Okada, Katsuhiko Tomita