Patents Assigned to Materia Nova
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Publication number: 20130029138Abstract: A conventional polymer is grafted from a plasma polymer layer provided at a substrate surface by radical polymerisation initiated from plasma induced radicals present at or in the plasma polymer, particularly radicals provided during deposition of the plasma polymer.Type: ApplicationFiled: January 26, 2011Publication date: January 31, 2013Applicants: MATERIA NOVA, UNIVERSITE DE MONSInventors: Freddy BĂ©nard, Philippe Dubois, Marjorie Olivier, Rony Snyders, Laurent Denis, Farid Khelifa, Damien Thiry, Fabian Renaux
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Patent number: 8119713Abstract: A polylactide-based polymer or copolymer (PLA) compositions with improved flame retardancy properties as obtained by conventional melt-blending of PLA polyester matrix (1) with both calcium sulfate (2) and organo-modified layered silicates (OMLS) (3). Combination of CaSO4 and OMLS exhibits synergistic effects on PLA flame retardancy by both significantly increasing the time to ignition and decreasing the heat release rate per unit area, and promoting non-dripping properties. Moreover, all other properties of PLA remain almost unchanged or are improved as regards to pristine PLA, especially thermal and mechanical properties.Type: GrantFiled: February 1, 2008Date of Patent: February 21, 2012Assignees: Materia Nova, Ecole Nationale Superieure de Chimie de Lillie, Ecole Nationale Superieure des Arts et Industries TextilesInventors: Philippe Dubois, Marius Murariu, Michael Alexandre, Philippe Degee, Serge Bourbigot, Rene Delobel, Gaelle Fontaine, Eric Devaux
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Publication number: 20100209728Abstract: The present invention provides a magnetron co-sputtering device (6) comprising a main magnetron cathode (x) and a secondary cathode (Y) adapted to be associated with each other to sputter deposit a material on a substrate (2) arranged at a substrate position, the material comprising a first material derived from the main cathode (X) and a second material derived from the secondary cathode (Y), wherein the secondary cathode (Y) is arranged between the main cathode (X) and the substrate position, at a position selected from: (i) a position within a magnetic field derived from a main cathode (X) magnetic source, and (ii) a position within the footprint (6) of the main cathode (X).Type: ApplicationFiled: July 11, 2008Publication date: August 19, 2010Applicant: Materia NovaInventors: Jean-Pierre Dauchot, Corinne Nouvellon
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Publication number: 20100184894Abstract: A polylactide-based polymer or copolymer (PLA) compositions with improved flame retardancy properties as obtained by conventional melt-blending of PLA polyester matrix (1) with both calcium sulfate (2) and organo-modified layered silicates (OMLS) (3). Combination of CaSO4 and OMLS exhibits synergistic effects on PLA flame retardancy by both significantly increasing the time to ignition and decreasing the heat release rate per unit area, and promoting non-dripping properties. Moreover, all other properties of PLA remain almost unchanged or are improved as regards to pristine PLA, especially thermal and mechanical properties.Type: ApplicationFiled: February 1, 2008Publication date: July 22, 2010Applicants: Materia Nova, Ecole Nationale Superieure De Chimie de Lille, Ecole Nationale Superieure des Arts et Industries TextilesInventors: Philippe Dubois, Marius Murariu, Michael Alexandre, Philippe Degee, Serge Bourbigot, Rene Delobel, Gaelle Fontaine, Eric Devaux
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Publication number: 20100060826Abstract: A grafted polymer and its use in polymer/liquid crystal composite films, and more particularly in PDLC films, is disclosed. The grafted polymer includes (alkyl)acrylic acid or (alkyl)acrylamide moieties. At least one of the moieties is grafted with an alkylphenol or with an alkoxylated alkylphenol.Type: ApplicationFiled: May 5, 2006Publication date: March 11, 2010Applicants: Universite De Mons Hainaut, Universite Du Litteral Cote Opale, Materia Nova ASBLInventors: Benoit Duponchel, Abdelaziz Elass, Mourad Boussoualem, Jean-Marc Buisine, Joel De Coninck, Valerie Celine Ledauphin, Mickael Coquelet, Alexandre Vaillant
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Publication number: 20070034498Abstract: The present invention relates to the deposition in a magnetron reactor (1) equipped with a magnetron cathode (MC) of at least one material on a substrate (11a), according to which process said material is vaporized by magnetron sputtering, using a gas that is ionized in pulsed mode. To this effect and in order to favour the formation of high current pulses of short duration while avoiding the formation of electric arcs and while enabling an effective ionisation of the sputtered vapour, a preionization of the said gas prior to the application of the main voltage pulse on the magnetron cathode (MC) is carried out in order to generate current pulses (CP) whose decay time (Td), after cut-off of the main voltage pulse (VP) is shorter than 5 ?s.Type: ApplicationFiled: September 22, 2006Publication date: February 15, 2007Applicants: Materia Nova Asbl, Centre National De La Recherche Scientifique (CNRS, Universite Paris-SudInventors: Mihai Ganciu-Petcu, Michel Hecq, Jean-Pierre Dauchot, Stephanos Konstantinidis, Jean Bretagne, Ludovic De Poucques, Michel Touzeau