Abstract: Provided is a cemented carbide suitable for use as a material in the manufacture of a punch for metal forming and in particular for the manufacture of metal beverage cans. The cemented carbide may include a hard phase that includes WC, a binder phase and a gamma phase. The gamma phase may include metal carbides in combination with metal nitrides or metal carbonitrides. A quotient of the average grain size of WC/the average grain size of the gamma phase may be in a range of from 0.5 to 1.5.

Abstract: A 3-D printing system includes a membrane configured to releasably retain a print sample thereon, a membrane release slidably supported on a portion of the membrane, and a vacuum source. The membrane release includes a housing defining a cavity within an interior portion thereof, a first roller rotatably supported within a portion of the cavity of the housing and rotatably disposed on a first portion of the membrane, and a second roller rotatably supported within a portion of the cavity of the housing in spaced relation from the first roller and forming a gap therebetween. The second roller is rotatably disposed on a second portion of the membrane and the vacuum source is in fluid communication with the cavity of the housing such that the application of a vacuum to the cavity effectuates a corresponding deformation of the membrane between the first and second rollers.

Abstract: Provided is a wear resistant, sintered body made of a binderless carbide, cermet or cemented carbide, e.g., WC, W2C and/or eta-phase, with a grain size less than 6.0 ?m, and less than 6% binder phase (e.g., Co—Ni—Fe). At least some working surfaces of the sintered body are surface treated with a boron yielding method including applying a low viscosity liquid medium having boron or aluminum content and heating at 1200° C. to 1450° C. under a pressure less than atmospheric pressure or a hydrogen containing atmosphere to from a hardness gradient with an increased hardness of the treated working surfaces of at least 50 to 200 HV5 and favorable compressive stresses in a surface zone that gives a tougher working surfaces of the boronized sintered bodies.

Abstract: A liquid alloy thermal paste comprises: a liquid alloy and a trace element, the liquid alloy and the trace element are stirred and reformed to a paste-like liquid alloy mixture that is viscous and does not flow easily, and the liquid alloy mixture is used as the liquid alloy thermal paste.

Abstract: A method for high resolution projection micro stereolithography for 3-D printing comprising: generating a 3D digital model of the sample to be printed in a computer, slicing the digital model into a sequence of images, wherein each of the images of the sequence represents a layer of the 3D digital model, positioning a transparent printing head relative to a resin vat containing a photo-sensitive resin, moving the transparent printing head into position for selectively exposing the photosensitive resin, sending an image from the sequence of images to a LCD or DLP chip, and together with a light source projecting the image through a lens onto the flat tip of the transparent printing head to initiate cure of the photosensitive resin in areas where the projected image allows light from the light source to reach the photosensitive resin.

Abstract: A method for multi-material high resolution projection micro stereolithography for 3-D printing of a sample, comprising: A) generating a 3D digital model of the sample to be printed in a computer, B) arranging a lens having an optical axis, a charge coupled device (CCD), and a printing head relative to a surface of a substrate, C) positioning the printing head, D) moving the printing head relative to the substrate by moving the substrate, the printing head, or both the substrate and the printing head, E) sending an image from the control computer to an LCD micro display chip, projecting the image from the LCD or DLP chip through the lens onto a surface of the flat tip of the printing head, and F) and changing the printing material to be used for printing a following layer or layer section.

Abstract: According to the present invention, a piezoelectric film having a single crystal structure is able to be formed, from various piezoelectric materials, on a film structure of the present invention. A film structure according to the present invention includes: a substrate; a buffer film which is formed on the substrate and has a tetragonal crystal structure containing zirconia; a metal film containing a platinum group element, which is formed on the buffer film by means of epitaxial growth; and a film containing Sr(Ti1?x, Rux)O3 (wherein 0?x?1), which is formed on the metal film by means of epitaxial growth.

Abstract: A method of preparation of an article having a sliding surface and comprising graphitic particles, comprises the steps of: i) impregnating open porosity in a porous body with a resin comprising graphitic particles; and ii) hardening said resin.

Abstract: Ferroelectric ceramics including: a Pb(Zr1-BTiB)O3 seed crystal film formed on a foundation film; and a Pb(Zr1-xTix)O3 crystal film, wherein: the seed crystal film is formed by sputtering while the foundation film is being disposed on an upper side of a sputtering target and the foundation film is being made to face the sputtering target; in the seed crystal film, a Zr/Ti ratio on the crystal film side from the center in the thickness direction thereof is larger than a Zr/Ti ratio on the foundation film side from the center in the thickness direction thereof; the crystal film is crystallized by coating and heating a solution containing, in an organic solvent, a metal compound wholly or partially containing ingredient metals of the crystal film and a partial polycondensation product thereof; and the B and the x satisfy formulae 2 and 3, respectively, below, 0.1<B<1??formula 2 0.1<x<1??formula 3.

Abstract: A film structure includes a substrate (11) which is a silicon substrate including an upper surface (11a) composed of a (100) plane, an alignment film (12) which is formed on the upper surface (11a) and includes a zirconium oxide film which has a cubic crystal structure and is (100)-oriented, and a conductive film (13) which is formed on the alignment film (12) and includes a platinum film which has a cubic crystal structure and is (100)-oriented. An average interface roughness of an interface (IF1) between the alignment film (12) and the conductive film (13) is greater than an average interface roughness of an interface (IF2) between the substrate (11) and the alignment film (12).

Abstract: A microwave heating system configured for heating a plurality of articles is provided. One or more of the microwave launchers can be offset slightly, such that the microwave energy introduced into the heating chamber is discharged at a launch tilt angle of at least 2°. Additionally, each launcher can include a microwave-transparent window disposed between the microwave chamber and the one or more launch openings and at least 50 percent of the chamber-side surface of the window can be oriented at an angle of at least 2° from the horizontal.

Abstract: A workflow system includes a workflow database. The workflow database may convert proposals or bids into a workflow process. The workflow process may involve one or more tasks which are performed by resources. The workflow database may have access to systems, or provide a system to interface with resources, contractors, vendors, billing departments, and generate reports of workflow process.

Abstract: A plasma CVD device includes a chamber (102), an anode (104), a cathode (103), a holding portion which holds a substrate to be deposited (101) a plasma wall (88) an anti-adhesion member (91) which is arranged between a first gap (81) between the anode and the plasma wall and a first inner surface (102a) of the chamber and a pedestal (92) which is arranged between the anti-adhesion member and a back surface of the anode and which is electrically connected to the anode. The maximum diameter of each of the first gap, a second gap (82) between the anode and the anti-adhesion member, a third gap (83) between the back surface of the anode and the pedestal, a fourth gap (84) between the plasma wall and the anti-adhesion member and a fifth gap (85) between the anti-adhesion member and the pedestal is equal to or less than 4 mm.

Abstract: An apparatus for removing paint from a metallic component. The apparatus includes an electrolytic cell in which the metallic component is an anode, and a DC power supply capable of producing a plasma causing the paint from the metallic component to disintegrate. A method of depainting a metallic component includes providing an electrolytic cell with the metallic component to be depainted acting as an anode. A DC power supply connected to the cathode and anode is activated to produce a plasma causing the paint from the metallic component to disintegrate. Another method of method of depainting a metallic component includes providing an aqueous solution of sodium hydrogen carbonate, sodium citrate, and potassium oxalate as an electrolyte, a cathode and a pained metallic component as an anode. A DC power supply connected to the cathode and anode produces a plasma causing the paint from the painted metallic component to disintegrate.

Abstract: An electrically active electrode material for use with a lithium ion cell, a lithium ion cell, and a method for forming the electrochemically active material electrode material are described. The electrode material is in the form of a sheet or mat formed of a valve metal material formed of filaments of a valve metal not larger than about 10 microns in cross section, and coated with an electrochemically active material such as silicon nanoparticles.

Abstract: A film structure (10) includes a substrate (11), a piezoelectric film (14) formed on the substrate (11) and containing first composite oxide represented by a composition formula Pb(Zr1?xTix)O3, and a piezoelectric film (15) formed on the piezoelectric film (14) and containing second composite oxide represented by a composition formula Pb(Zr1?yTiy)O3. In the composition formulae, x satisfies 0.10<x?0.20, and y satisfies 0.35?y?0.55. The piezoelectric film (14) has tensile stress, and the piezoelectric film (15) has compressive stress.

Abstract: An object is to cause a piezoelectric film to perform a piezoelectric operation at a higher voltage than the conventional piezoelectric film. An aspect of the present invention is a piezoelectric film, wherein a voltage at which a piezoelectric butterfly curve that is a result obtained by measuring a piezoelectric property of a piezoelectric film takes a minimum value is larger by 2 V or more than a coercive voltage of a hysteresis curve that is a result obtained by measuring a hysteresis property of said piezoelectric film. The piezoelectric film includes an anti-ferroelectric film, and a ferroelectric film formed on the anti-ferroelectric film.

Abstract: An improved structure of nano-scaled and nanostructured Si particles is provided for use as anode material for lithium ion batteries. The Si particles are prepared as a composite coated with MgO and metallurgically bonded over a conductive refractory valve metal support structure.