Patents Assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO., LITD.
  • Pattern formation method
    Publication number: 20030143494
    Abstract: Pattern exposure is performed by selectively irradiating a resist film with extreme UV of a wavelength of a 1 nm through 30 nm band at exposure energy of 5 mJ/cm2 or less. After the pattern exposure, the resist film is developed so as to form a resist pattern.
    Type: Application
    Filed: January 27, 2003
    Publication date: July 31, 2003
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LITD.
    Inventors: Masayuki Endo, Masaru Sasago