Patents Assigned to MAY-HWA ENTERPRISE CORPORATION
  • Patent number: 11161957
    Abstract: The present invention provides a 3D porous structure of parylene including a poly-p-xylylenes structure having a plurality of pores. The poly-p-xylylenes structure has a porosity. According to an embodiment of the present invention, the size of the porous structure is between 20 nm and 5 cm. According to an embodiment of the present invention, the porosity is between 55% and 85%. According to an embodiment of the present invention, the porous structure further includes a plurality of target molecules. According to an embodiment of the present invention, the pores of the poly-p-xylylenes structure include pore sizes of different sizes. The pore sizes are varying in a gradient. According to an embodiment of the present invention, the porous structure is formed integrally.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: November 2, 2021
    Assignee: MAY-HWA ENTERPRISE CORPORATION
    Inventors: Hsien-Yeh Chen, Hsing-Ying Tung
  • Patent number: 10336692
    Abstract: The present invention provides a method of forming paracyclyophane containing disulfide functional group. The paracyclophane is prepared by adding 3,3?-dithiodipropionic acid (DPDPA) and N-ethyl-N?-(3-(dimethylamino)propyl)carbodiimide (EDC) into 4-aminomethyl [2,2] paracyclophane. The present invention further provides a chemical film and a method of forming the same. The chemical film contains poly-p-xylylene with disulfide functional group and is formed on a substrate by a chemical vapor deposition process.
    Type: Grant
    Filed: March 7, 2018
    Date of Patent: July 2, 2019
    Assignee: MAY-HWA ENTERPRISE CORPORATION
    Inventors: Hsien-Yeh Chen, Zhen-Yu Guan, Chih-Yu Wu
  • Patent number: 10246412
    Abstract: The present invention provides a method of forming paracyclyophane containing disulfide functional group. The paracyclophane is prepared by adding 3,3?-dithiodipropionic acid (DPDPA) and N-ethyl-N?-(3-(dimethylamino)propyl)carbodiimide (EDC) into 4-aminomethyl [2,2] paracyclophane. The present invention further provides a chemical film and a method of forming the same. The chemical film contains poly-p-xylylene with disulfide functional group and is formed on a substrate by a chemical vapor deposition process.
    Type: Grant
    Filed: June 16, 2016
    Date of Patent: April 2, 2019
    Assignee: MAY-HWA ENTERPRISE CORPORATION
    Inventors: Hsien-Yeh Chen, Zhen-Yu Guan, Chih-Yu Wu
  • Patent number: 10035875
    Abstract: A patterned film structure consists of a substrate and of a patterned polymeric layer which selectively covers and exposes part of the surface of the substrate. The patterned polymeric layer is selected form at least one of an unsubstituted poly-para-xylylene and a substituted poly-para-xylylene.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: July 31, 2018
    Assignee: MAY-HWA ENTERPRISE CORPORATION
    Inventors: Hsien-Yeh Chen, Chih-Yu Wu
  • Patent number: 9862799
    Abstract: Provided is a poly-p-xylyene having at least one chemically active functional group present in a form of particles. In an embodiment, the functionalized poly-p-xylylene is synthesized via CVD, and electrospinning is then performed at a relatively low polymer concentration, so as to produce functionalized poly-p-xylylene particles. The functionalized poly-p-xylyene particles have a particle size at nano-scale or micro-scale. Such functionalized poly-p-xylyene particles can be applied to biological fields extensively.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: January 9, 2018
    Assignee: MAY-HWA ENTERPRISE CORPORATION
    Inventors: Hsien-Yeh Chen, Hsin-Ying Ho, Ho-Yi Sun, Cheng-Yuan Fang