Patents Assigned to MCK TECH CO., LTD.
  • Patent number: 12025580
    Abstract: An ion detection sensor fabrication method includes: preparing an ion-sensitive film preparation solution; preparing an ion-sensitive mixed layer preparation solution by mixing the ion-sensitive film preparation solution with graphene powder; and forming an ion-sensitive mixed layer sensitive to a target ion by applying the ion-sensitive mixed layer preparation solution to fill a gap between a source and a drain spaced apart from each other and to cover at least a portion of an upper surface of each of the source and the drain.
    Type: Grant
    Filed: October 18, 2021
    Date of Patent: July 2, 2024
    Assignee: MCK TECH CO., LTD.
    Inventors: Seung Min Cho, Min Gu Cho, Ki Soo Kim, Hong Gi Oh
  • Publication number: 20220349853
    Abstract: An ion detection sensor fabrication method includes: preparing an ion-sensitive film preparation solution; preparing an ion-sensitive mixed layer preparation solution by mixing the ion-sensitive film preparation solution with graphene powder; and forming an ion-sensitive mixed layer sensitive to a target ion by applying the ion-sensitive mixed layer preparation solution to fill a gap between a source and a drain spaced apart from each other and to cover at least a portion of an upper surface of each of the source and the drain.
    Type: Application
    Filed: October 18, 2021
    Publication date: November 3, 2022
    Applicant: MCK TECH CO., LTD.
    Inventors: Seung Min CHO, Min Gu CHO, Ki Soo KIM, Hong Gi OH