Abstract: An electron beam source provides beam focusing by placing magnets under the crucible. The location of the magnets, operating in conjunction with the remaining magnetic and electromagnetic structure, permits varying sizes of crucibles to be used without redesign of the remainder of the electron beam source.
Type:
Grant
Filed:
March 10, 1998
Date of Patent:
January 11, 2000
Assignee:
MDC Vacuum Products Corp.
Inventors:
Nick Tsujimoto, Peter H. Harris, Wei Gao