Abstract: A mirror includes a carrier, a reflecting layer disposed above a main face of the carrier, and a transparent layer disposed above the reflective layer. The carrier includes a base body, and the base body includes one or more of a material comprising a density in a range from 0.1 to 1.0 g/cm3, a porous material, a foamed material, a material comprising a structure containing closed cells, a material comprising a honeycomb structure, or a structure containing carbon fibers.

Abstract: A manufacturing method creates a type of telescope which is athermal, lightweight, optical quality for visible and IR applications. The method includes: a) optical mirrors being made by immersing a master, that is an optical component with a curvature opposite to the mirror required into an electrolytic bath where the applied current transfers metal ions and deposit them on the master, the cathode, as a layer, b) the layer being bonded by an adhesive, solder or any other attachment process to a mechanical reinforcing structure, c) after the hardening of the bond or glue, the thin layer being finally released from the master and having maintained the optical quality of the master. The master or mandrel can be cleaned and reused for repeating this method and manufacturing large series of telescopes.

Abstract: A process for forming an article having at least one precision surface is disclosed. The process includes providing a thin sheet in contact with a surface of a mandrel. The process then includes establishing a pressure differential between opposite sides of the thin sheet using a collapsible enclosure so that the thin sheet is drawn onto the mandrel surface, thereby causing the thin sheet to substantially conform to the shape of the mandrel surface. The shaped thin sheet is then secured to a support member to define the article. The article is then removed from the mandrel. The front surface of the thin sheet defines the precision surface of the article. A process for forming a dual-sided precision article is also disclosed, along with an adaptive optical system and method that employs the precision article.

Abstract: A mirror includes a carrier, a reflecting layer disposed above a main face of the carrier, and a transparent layer disposed above the reflective layer. The carrier includes a base body, and the base body includes one or more of a material comprising a density in a range from 0.1 to 1.0 g/cm3, a porous material, a foamed material, a material comprising a structure containing closed cells, a material comprising a honeycomb structure, or a structure containing carbon fibers.

Abstract: A process for forming an article having at least one precision surface is disclosed. The process includes providing a thin sheet in contact with a surface of a mandrel. The process then includes establishing a pressure differential between opposite sides of the thin sheet using a collapsible enclosure so that the thin sheet is drawn onto the mandrel surface, thereby causing the thin sheet to substantially conform to the shape of the mandrel surface. The shaped thin sheet is then secured to a support member to define the article. The article is then removed from the mandrel. The front surface of the thin sheet defines the precision surface of the article. A process for forming a dual-sided precision article is also disclosed, along with an adaptive optical system and method that employs the precision article.

Abstract: Systems and methods for synchronous operation of debris-mitigation devices (DMDs) in an EUV radiation source that emits EUV radiation and debris particles are disclosed. The methods include establishing a select relative angular orientation between the first and second DMDs that provides a maximum amount of transmission of EUV radiation between respective first and second rotatable vanes of the first and second DMDs. The methods also include rotating the first and second sets of vanes to capture at least some of the debris particles while substantially maintaining the select relative angular orientation. The systems employ DMD drive units, and an optical-based encoder disc in one of the DMD drive units measures and controls the rotational speed of the rotatable DMD vanes. Systems and methods for optimally aligning the DMDs are also disclosed.

Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Abstract: A three-mirror anastigmatic with at least one non-rotationally symmetric mirror is disclosed. The at least one non-rotationally symmetric mirror may be an electroformed mirror shell having a non-rotationally symmetric reflective surface formed by a correspondingly shaped mandrel.

Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.

Abstract: A Sn vapor EUV LLP source system for EUV lithography is disclosed. The system generates a Sn vapor column from a supply of Sn liquid. The Sn column has a Sn-atom density of <1019 atoms/cm3 and travels at or near sonic speeds. The system also has a Sn vapor condenser arranged to receive the Sn vapor column and condense the Sn vapor to form recycled Sn liquid. A pulse laser irradiates a section of the Sn vapor column. Each pulse generates an under-dense Sn plasma having an electron density of <1019 electrons/cm3, thereby allowing the under-dense Sn plasma substantially isotropically emit EUV radiation.

Abstract: A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

Abstract: An EUV mirror module is disclosed that comprises a substrate with a curved upper surface and a curved electroformed mirror. A self-adjusting bonding material is disposed between the substrate and the electroformed mirror. The bonding material is flowable at a melting temperature and self-adjusts to conformally fill the region between substrate to the electroformed mirror and bond the substrate and the electroformed mirror. The substrate may have at least one cooling channel for cooling the mirror module.

Abstract: Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.

Abstract: Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a structure having a leading end and that defines a chamber. The chamber operably supports at least one wicking layer. A conduit connects the wicking layer to a condenser system that support cooling fluid in a reservoir. When heat is applied to the leading end, the cooling fluid is drawn into the chamber from the condenser unit via capillary action in the wicking layer and an optional gravity assist, while vapor is drawn in the opposite direction from the chamber to the condenser unit. Heat is removed from the condensed vapor at the condenser unit, thereby cooling the GIC mirror shell.

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract: A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

Abstract: A stress-decoupling device and methods of using same in a cooled grazing-incidence collector (GIC) mirror system are disclosed. A method includes providing a cooled GIC shell, providing input and output primary cooling-fluid manifolds, and fluidly connecting the cooled GIC shell to the input and output primary cooling-fluid manifolds through respective stress-decoupling devices. An exemplary stress-decoupling device includes inner and outer bellows that define a sealed cavity filled with a gas. An expansion-limiting member within the sealed cavity limits the expansion of the inner bellows due to the pressure of the cooling fluid flowing therethrough. The stress-decoupling device reduces or prevents the communication of stress from parts of the GIC mirror system to the GIC shells. Stress-decoupling systems and methods for a cooled spider as used in a GIC mirror system are also disclosed.

Abstract: A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.

Abstract: A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.