Patents Assigned to Megalpanel Corporation
  • Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
    Patent number: 5835195
    Abstract: A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection lens. A loading system, wafer adjustment system, and focusing system are also disclosed.
    Type: Grant
    Filed: March 14, 1994
    Date of Patent: November 10, 1998
    Assignee: Megalpanel Corporation
    Inventors: John A. Gibson, Jeffrey G. Knirck