Patents Assigned to MEMSEN ELECTRONICS INC
  • Patent number: 9958471
    Abstract: A MEMS inertial sensor, may include a movable sensitive element; and second substrate and a third substrate. The movable sensitive element may be formed by using a first substrate which may be formed of a monocrystalline semiconductor material. The first substrate may include a first surface and a second surface which are opposite to each other. One or more conductive layers may be formed on the first surface of the first substrate The second substrate may be coupled to a surface of the one or more conductive layer on the first substrate. The third substrate may be coupled to the second surface of the first substrate. The third substrate and the second substrate are respectively arranged on two opposite sides of the movable sensitive element.
    Type: Grant
    Filed: February 23, 2012
    Date of Patent: May 1, 2018
    Assignee: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Patent number: 9949037
    Abstract: A Micro-Electro-Mechanical System (MEMS) microphone and a method for forming the same are provided. The method includes: providing a first substrate including a first surface and a second surface opposite to each other; providing a second substrate including a third surface and a fourth surface opposite to each other; bonding the first surface of the first substrate and the third surface of the second substrate to each other; removing a second base of the second substrate to form a fifth surface opposite to the third surface of the second substrate; forming a cavity between the first substrate and the sensitive region of the second substrate; and forming a first conductive plug from the side of the fifth surface of the second substrate, with the first conductive plug passing through to at least one of the conductive layers.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: April 17, 2018
    Assignee: MEMSEN ELECTRONICS INC
    Inventor: Manhing Chau
  • Patent number: 9738513
    Abstract: Provided are a MEMS pressure sensor and a method for forming the MEMS pressure sensor. The method includes: preparing a first substrate, where the first substrate includes a first surface and a second surface opposite to the first surface; preparing a second substrate, where the second substrate includes a third surface and a fourth surface opposite to the third surface, the second substrate includes a pressure sensing region; bonding the first surface of the first substrate and the third surface of the second substrate with each other; forming a cavity between the first substrate and the pressure sensing region of the second substrate; removing the second base to form a fifth surface opposite to the third surface of the second substrate; and forming a first conductive plug passing through the second substrate from the side of the fifth surface of the second substrate to the at least one conductive layer.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: August 22, 2017
    Assignee: MEMSEN ELECTRONICS INC
    Inventor: Manhing Chau
  • Patent number: 9674619
    Abstract: A micro-electro-mechanical system (MEMS) microphone and a forming method therefore. The MEMS microphone comprises: a first substrate, the first substrate is provided with a first bonding face, the first substrate comprises an MEMS microphone component and a first conductive bonding structure arranged on the first bonding face, a second substrate, the second substrate is provided with a second bonding face, the second bonding substrate comprises a circuit and a second conductive bonding structure arranged on the second bonding face; the first substrate and the second substrate are oppositely fitted together via the first conductive bonding structure and the second conductive bonding structure. Embodiments of the present invention have a simple packaging technique and a compact size; the MEMS microphone packaging structure formed has a great performance on signal-to-noise ratio, and a great anti-interference capability.
    Type: Grant
    Filed: February 22, 2012
    Date of Patent: June 6, 2017
    Assignee: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Patent number: 9448251
    Abstract: An integrated inertial sensor and pressure sensor may include a first substrate including a first surface and a second surface; at least one or more conductive layers, formed on the first surface of the first substrate; a movable sensitive element, formed by using a first region of the first substrate; a second substrate and a third substrate, the second substrate being coupled to a surface of the conductive layer, the third substrate being coupled to the second surface of the first substrate in which the movable sensitive element of the inertial sensor is formed, and the third substrate and the second substrate are respectively arranged on opposite sides of the movable sensitive element; and a sensitive film of the pressure sensor, including at least a second region of the first substrate, or including at least one of the conductive layers on the second region of the first substrate.
    Type: Grant
    Filed: February 23, 2012
    Date of Patent: September 20, 2016
    Assignee: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Patent number: 9073746
    Abstract: A Micro Electromechanical System (MEMS) pressure sensor may include a first substrate provided with a sensitive diaphragm of a piezoresistive pressure sensing unit, an electrical connecting diffusion layer and a first bonding layer on a surface of the first substrate; and a second substrate provided with an inter-conductor dielectric layer, a conductor connecting layer in the inter-conductor dielectric layer and/or a second bonding layer on a surface of the second substrate. The second substrate may be arranged opposite to the first substrate, and the second substrate may be fixedly coupled to the first substrate via the first bonding layer and the second bonding layer; the pattern of the first bonding layer is corresponding to the pattern of the second bonding layer, and both the first bonding layer and the second bonding layer may be formed of a conductive material.
    Type: Grant
    Filed: February 23, 2012
    Date of Patent: July 7, 2015
    Assignee: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Patent number: 9073745
    Abstract: A Micro Electromechanical System (MEMS) pressure sensor may include a first substrate provided with a sensitive diaphragm of a capacitive pressure sensing unit, an electrical connecting layer and a first bonding layer on a surface of the first substrate; and a second substrate provided with an inter-conductor dielectric layer, a conductor connecting layer in the inter-conductor dielectric layer and/or a second bonding layer on a surface of the second substrate. The second substrate is arranged opposite to the first substrate, and the second substrate is fixedly coupled to the first substrate via the first bonding layer and the second bonding layer; a pattern of the first bonding layer is corresponding to a pattern of the second bonding layer, and both the first bonding layer and the second bonding layer are formed of a conductive material.
    Type: Grant
    Filed: February 23, 2012
    Date of Patent: July 7, 2015
    Assignee: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Publication number: 20140001584
    Abstract: An MEMS pressure sensor comprising: a first substrate (100) having a sensing diaphragm (101a) of a piezoelectric pressure sensing unit (101), an electrical connection diffusion layer (103), and a first bonding layer (102) on a surface of the first substrate (100), a second substrate (200) having an inter-conductor dielectric layer (203), a conductor connection layer (201) arranged within the inter-conductor dielectric layer (203), and a second bonding layer (202) on a surface of the second substrate (200). The second substrate (200) and the first substrate (100) are oppositely arranged, and are fixedly coupled via the first bonding layer (102) and the second bonding layer (202); the first bonding layer (102) and the second bonding layer (202) have matching patterns and are both made from a conductive material. Also provided is a method for manufacturing the MEMS pressure sensor.
    Type: Application
    Filed: February 23, 2012
    Publication date: January 2, 2014
    Applicant: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Publication number: 20140001579
    Abstract: A Micro Electromechanical System (MEMS) pressure sensor may include a first substrate provided with a sensitive diaphragm of a capacitive pressure sensing unit, an electrical connecting layer and a first bonding layer on a surface of the first substrate; and a second substrate provided with an inter-conductor dielectric layer, a conductor connecting layer in the inter-conductor dielectric layer and/or a second bonding layer on a surface of the second substrate. The second substrate is arranged opposite to the first substrate, and the second substrate is fixedly coupled to the first substrate via the first bonding layer and the second bonding layer; a pattern of the first bonding layer is corresponding to a pattern of the second bonding layer, and both the first bonding layer and the second bonding layer are formed of a conductive material.
    Type: Application
    Filed: February 23, 2012
    Publication date: January 2, 2014
    Applicant: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Publication number: 20140001581
    Abstract: A micro-electro-mechanical system (MEMS) microphone may include a sensitive diaphragm and a fixed electrode corresponding to the sensitive diaphragm; at least one sensitive diaphragm support located on the surface of the sensitive diaphragm corresponding to the fixed electrode; and a sensitive diaphragm support arm coupled to the sensitive diaphragm support.
    Type: Application
    Filed: February 22, 2012
    Publication date: January 2, 2014
    Applicant: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Publication number: 20140003633
    Abstract: A micro-electro-mechanical system (MEMS) microphone and a forming method therefore. The MEMS microphone comprises: a first substrate, the first substrate is provided with a first bonding face, the first substrate comprises an MEMS microphone component and a first conductive bonding structure arranged on the first bonding face, a second substrate, the second substrate is provided with a second bonding face, the second bonding substrate comprises a circuit and a second conductive bonding structure arranged on the second bonding face; the first substrate and the second substrate are oppositely fitted together via the first conductive bonding structure and the second conductive bonding structure.
    Type: Application
    Filed: February 22, 2012
    Publication date: January 2, 2014
    Applicant: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Publication number: 20130340526
    Abstract: A MEMS inertial sensor, may include a movable sensitive element; and second substrate and a third substrate. The movable sensitive element may be formed by using a first substrate which may be formed of a monocrystalline semiconductor material. The first substrate may include a first surface and a second surface which are opposite to each other. One or more conductive layers may be formed on the first surface of the first substrate The second substrate may be coupled to a surface of the one or more conductive layer on the first substrate. The third substrate may be coupled to the second surface of the first substrate. The third substrate and the second substrate are respectively arranged on two opposite sides of the movable sensitive element.
    Type: Application
    Filed: February 23, 2012
    Publication date: December 26, 2013
    Applicant: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu
  • Publication number: 20130340525
    Abstract: An integrated inertial sensor and pressure sensor may include a first substrate including a first surface and a second surface; at least one or more conductive layers, formed on the first surface of the first substrate; a movable sensitive element, formed by using a first region of the first substrate; a second substrate and a third substrate, the second substrate being coupled to a surface of the conductive layer, the third substrate being coupled to the second surface of the first substrate in which the movable sensitive element of the inertial sensor is formed, and the third substrate and the second substrate are respectively arranged on opposite sides of the movable sensitive element; and a sensitive film of the pressure sensor, including at least a second region of the first substrate, or including at least one of the conductive layers on the second region of the first substrate.
    Type: Application
    Filed: February 23, 2012
    Publication date: December 26, 2013
    Applicant: MEMSEN ELECTRONICS INC
    Inventor: Lianjun Liu