Abstract: A micro light-emitting diode device includes a substrate, a micro light-emitting diode, and a transparent top electrode. The micro light-emitting diode is disposed on the substrate and includes a p-type GaN layer, an n-type GaN layer above the p-type GaN layer, an n-doped AlxGa(1?x)N layer above and in contact with the n-type GaN layer, and an active layer between the p-type GaN layer and the n-type GaN layer. x is equal to or greater than 0.02 and smaller than 1. The transparent top electrode covers and is in contact with the n-doped AlxGa(1?x)N layer. A refractive index of the n-doped AlxGa(1?x)N layer is smaller than a refractive index of the n-type GaN layer. A sum of the thicknesses of the n-type GaN layer and the n-doped AlxGa(1?x)N layer is greater than a sum of the thicknesses of the active layer and the p-type GaN layer.