Abstract: A process for producing polymeric films by applying a liquid composition onto a surface of a substrate under vacuum conditions in a vacuum chamber. The composition has a first component which is polymerizable or crosslinkable in the presence of a sufficient amount of an acid; and a cationic photoinitiator which generates an acid upon exposure to ultraviolet radiation, electron beam radiation or both to cause polymerizing or crosslinking of the first component. A gas which emits ultraviolet radiation upon exposure to electron beam radiation is introduced into the vacuum chamber. The composition and the gas are exposed to electron beam radiation to cause the cationic photoinitiator to generate an amount of an acid to cause polymerizing or crosslinking of the first component. The composition is exposed to both electron beam radiation and gas-generated ultraviolet radiation and cured.

Abstract: A liquid composition and a process for coating the composition onto a surface of a substrate in a substantially oxygen-free atmosphere, under vacuum conditions. The composition comprises one or more components, all of which components do not go into a gas or vapor phase under the vacuum conditions. The composition has an ethylenically unsaturated component composed of an ethylenically unsaturated methacrylate monomer, or a combination of an ethylenically unsaturated methacrylate monomer and an ethylenically unsaturated methacrylate oligomer. The ethylenically unsaturated component is polymerizable or crosslinkable by the application of sufficient electron beam radiation. The composition is substantially absent of ethylenically unsaturated acrylate components, substantially absent of polymerization initiators, and substantially absent of solvents. The composition optionally further comprises one or more polymers without an acrylate functional group and without a methacrylate functional group.