Patents Assigned to Metascape, LLC.
  • Patent number: 11306389
    Abstract: The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: April 19, 2022
    Assignee: METASCAPE LLC
    Inventors: Terrence S. Mcgrath, Deidre Sewell, Daniel M. Storey
  • Publication number: 20140127391
    Abstract: The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.
    Type: Application
    Filed: January 7, 2014
    Publication date: May 8, 2014
    Applicant: METASCAPE, LLC
    Inventors: TERRENCE S. MCGRATH, DEIDRE SEWELL, DANIEL M. STOREY
  • Patent number: 8623446
    Abstract: The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.
    Type: Grant
    Filed: October 3, 2006
    Date of Patent: January 7, 2014
    Assignee: Metascape LLC
    Inventors: Terrence S. McGrath, Deidre Sewell, Daniel M. Storey
  • Publication number: 20130053938
    Abstract: A molecular plasma deposition (MPD) method in combination with an atomic layer deposition (ALD) procedure is used to produce amorphous, nonconformal thin metal film coatings on a variety of substrates. The films are porous, mesh-like lattices with imperfections such as pinholes and pores, which are useful as scaffolds for cell attachment, controlled release of bioactive agents and protective coatings.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 28, 2013
    Applicant: METASCAPE LLC
    Inventors: Tiffany E. Miller, Daniel M. Storey, Barbara S. Kitchell
  • Patent number: 8158216
    Abstract: Vapor plasma deposition of titanium (Ti) metal onto a substrate forms a structured surface that exhibits enhanced cell attachment properties. Initially deposited round nanoparticulate surface structures develop tentacles with a spine or thorn-like appearance upon continued deposition under special conditions. The density and size of the formed spinulose particles can be controlled by timing the deposition intervals. A significant increase in osteoblast, fibroblast and endothelial cell attachment is observed on Ti spinulose surfaces compared to attachment on nanoparticulate surfaces lacking spinulous nanostructure.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: April 17, 2012
    Assignee: Metascape LLC
    Inventors: Christina Kay Thomas, Luke J. Ryves, Daniel M. Storey
  • Patent number: 8066854
    Abstract: The invention is directed to efficient methods for depositing highly adherent anti-microbial materials onto a wide range of surfaces. A controlled cathodic arc process is described, which results in enhanced adhesion of silver oxide to polymers and other surfaces, such as surfaces of medical devices. Deposition of anti-microbial materials directly onto the substrates is possible in a cost-effective manner that maintains high anti-microbial activity over several weeks when the coated devices are employed in vivo.
    Type: Grant
    Filed: April 19, 2006
    Date of Patent: November 29, 2011
    Assignee: Metascape LLC
    Inventors: Daniel M. Storey, Deidre Sewell, Terrence S. McGrath, John H. Petersen
  • Patent number: 7920369
    Abstract: An apparatus and method for initiation and control of a sustained metal plasma and nano plasma (macroparticulate) deposition methods for preparing modified metal coatings are provided. The plasma deposition process can be tightly controlled by virtue of a device that incorporates a plasma arc initiator component and an internal power supply that is capable of controlling dwell time on the target and the size range of particles ejected in the plasma arc.
    Type: Grant
    Filed: January 23, 2007
    Date of Patent: April 5, 2011
    Assignee: Metascape, LLC.
    Inventor: Daniel M. Storey