Patents Assigned to Metascape, LLC.
  • Apparatus and method for nano plasma deposition
    Patent number: 7920369
    Abstract: An apparatus and method for initiation and control of a sustained metal plasma and nano plasma (macroparticulate) deposition methods for preparing modified metal coatings are provided. The plasma deposition process can be tightly controlled by virtue of a device that incorporates a plasma arc initiator component and an internal power supply that is capable of controlling dwell time on the target and the size range of particles ejected in the plasma arc.
    Type: Grant
    Filed: January 23, 2007
    Date of Patent: April 5, 2011
    Assignee: Metascape, LLC.
    Inventor: Daniel M. Storey