Patents Assigned to Metron Technology
  • Method and apparatus for repairing a photomask
    Patent number: 6593040
    Abstract: A method and apparatus for correcting phase shift defects in a photomask is provided by scanning the photomask for the defect and determining locations of at least one defect. Following the determination of the location of a defect, the defect is three-dimensionally analyzed producing three-dimensional results. Utilizing the three-dimensional results, a focus ion beam (FIB) is directed onto the defect to eliminate the defect. The FIB is controlled by an etch map which is generated based on the three-dimensional results. To provide further precision to the repairing of the photomask, test patterns of the FIB are generated and three-dimensionally analyzed. The three-dimensional test pattern results are further utilized in generating the etch map to provide greater control to the FIB.
    Type: Grant
    Filed: June 26, 2001
    Date of Patent: July 15, 2003
    Assignee: Metron Technology
    Inventor: Eryn Smith
  • Method and apparatus for repairing an alternating phase shift mask
    Patent number: 6322935
    Abstract: A method and apparatus for correcting phase shift defects in a photomask is provided by scanning the photomask for the defect and determining locations of at least one defect. Following the determination of the location of a defect, the defect is three-dimensionally analyzed producing three-dimensional results. Utilizing the three-dimensional results, a focus ion beam (FIB) is directed onto the defect to eliminate the defect. The FIB is controlled by an etch map which is generated based on the three-dimensional results. To provide further precision to the repairing of the photomask, test patterns of the FIB are generated and three-dimensionally analyzed. The three-dimensional test pattern results are further utilized in generating the etch map to provide greater control to the FIB.
    Type: Grant
    Filed: February 28, 2000
    Date of Patent: November 27, 2001
    Assignee: Metron Technology
    Inventor: Eryn Smith
  • Method and apparatus for repairing an alternating phase shift mask
    Publication number: 20010038954
    Abstract: A method and apparatus for correcting phase shift defects in a photomask is provided by scanning the photomask for the defect and determining locations of at least one defect. Following the determination of the location of a defect, the defect is three-dimensionally analyzed producing three-dimensional results. Utilizing the three-dimensional results, a focus ion beam (FIB) is directed onto the defect to eliminate the defect. The FIB is controlled by an etch map which is generated based on the three-dimensional results. To provide further precision to the repairing of the photomask, test patterns of the FIB are generated and three-dimensionally analyzed. The three-dimensional test pattern results are further utilized in generating the etch map to provide greater control to the FIB.
    Type: Application
    Filed: June 26, 2001
    Publication date: November 8, 2001
    Applicant: METRON TECHNOLOGY
    Inventor: Eryn Smith