Patents Assigned to Micro Lithography, Inc.
  • Patent number: 10771900
    Abstract: A speaker diaphragm structure is installed inside a sound generator device which comprises a frame, a speaker diaphragm structure installed within the frame and a suspension edge whose inner perimeter is connected to the speaker diaphragm structure and whose outer perimeter is connected to the frame; herein the speaker diaphragm structure includes a diaphragm body and a composite material layer, in which the composite material layer is used for bonding onto the surface of the diaphragm body or attaching within the diaphragm body; moreover, the composite material layer is composed of one or more types of tetrapyrrole compounds as well as one or more types of metal ions; additionally, the composite material layer has a thickness smaller than the thickness of the diaphragm body, and is mainly applied to provide the performance effect of sound quality modifications.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: September 8, 2020
    Assignees: FU JEN CATHOLIC UNIVERSITY, MICRO LITHOGRAPHY INC.
    Inventors: Ching-Bore Wang, Chien-Sheng Chen, Hao-Zhi Li, Wei-Jen Lee
  • Patent number: 8968971
    Abstract: Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: March 3, 2015
    Assignee: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Publication number: 20140255827
    Abstract: Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask.
    Type: Application
    Filed: March 8, 2013
    Publication date: September 11, 2014
    Applicant: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Patent number: 6841317
    Abstract: The present invention provides an optical pellicle system which includes a frame having a top side and bottom side, a pellicle membrane configured to cover the top side of the frame, a photomask to which the bottom side of the frame is mounted, and at least one venting slot defined in the photomask, extending under the frame from an area defined within the frame to an area outside of the frame.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: January 11, 2005
    Assignee: Micro Lithography, Inc.
    Inventor: Chung-Bore Wang
  • Publication number: 20040043302
    Abstract: The present invention provides an optical pellicle system which includes a frame having a top side and bottom side, a pellicle membrane configured to cover the top side of the frame, a photomask to which the bottom side of the frame is mounted, and at least one venting slot defined in the photomask, extending under the frame from an area defined within the frame to an area outside of the frame.
    Type: Application
    Filed: August 27, 2002
    Publication date: March 4, 2004
    Applicant: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Patent number: 6594073
    Abstract: An antistatic pellicle for use with deep-ultraviolet light. The pellicle is coated with a thin metal oxide layer that has high transmissivity for deep-ultraviolet light and an electrical resistivity low enough to minimize electrostatic discharge. The metal oxide layer may be produced by a sol-gel process using a reactive polyvalent metal sol-precursor. The sol-precursor is converted to a sol, the sol is applied to a membrane so that it produces a gel on a surface of the membrane, and then the gel is dried to a coating.
    Type: Grant
    Filed: May 30, 2001
    Date of Patent: July 15, 2003
    Assignee: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Patent number: 6573980
    Abstract: Optical pellicles for photomasks are described, where the optical pellicle is configured to be reversibly affixed to the photomask with a non-adhesive mounting member, such as a vacuum system or an electrostatic film. The optical pellicles of the invention are readily removed from the photomask and reattached without the use of adhesives, and are well-suited for use by automated methods.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: June 3, 2003
    Assignee: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Patent number: 6566021
    Abstract: Photomasks for photolithographic processes are described that incorporate a protective amorphous poly(fluorocarbon) film on their surface, the film serving to reduce contamination at the photomask surface. The preparation of the coated photomasks is also described, as is their use in a photolithographic process.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: May 20, 2003
    Assignee: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Publication number: 20030020894
    Abstract: Optical pellicles for photomasks are described, where the optical pellicle is configured to be reversibly affixed to the photomask with a non-adhesive mounting member, such as a vacuum system or an electrostatic film. The optical pellicles of the invention are readily removed from the photomask and reattached without the use of adhesives, and are well-suited for use by automated methods.
    Type: Application
    Filed: July 26, 2001
    Publication date: January 30, 2003
    Applicant: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Publication number: 20030022073
    Abstract: Photomasks for photolithographic processes are described that incorporate a protective amorphous poly(fluorocarbon) film on their surface, the film serving to reduce contamination at the photomask surface. The preparation of the coated photomasks is also described, as is their use in a photolithographic process.
    Type: Application
    Filed: July 26, 2001
    Publication date: January 30, 2003
    Applicant: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Publication number: 20020181092
    Abstract: An antistatic pellicle for use with deep-ultraviolet light. The pellicle is coated with a thin metal oxide layer that has high transmissivity for deep-ultraviolet light and an electrical resistivity low enough to minimize electrostatic discharge. The metal oxide layer may be produced by a sol-gel process using a reactive polyvalent metal sol-precursor. The sol-precursor is converted to a sol, the sol is applied to a membrane so that it produces a gel on a surface of the membrane, and then the gel is dried to a coating.
    Type: Application
    Filed: May 30, 2001
    Publication date: December 5, 2002
    Applicant: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Patent number: 6190743
    Abstract: The present invention provides a photomask protection system for minimizing contamination resulting from the removal of a pellicle from a photomask. The system comprises a continuous wall attached to the photomask and disposed between the region of the mask where the pellicle attaches and the photomask pattern. The wall is dimensioned to fit within the pellicle and to be spaced from the pellicle membrane and the pellicle frame. The wall minimizes the likelihood that any contaminants generated by the removal of a pellicle frame from the photomask surface will reach the photomask pattern. The wall may be coated with an adhesive to capture any contaminants that contact it.
    Type: Grant
    Filed: July 6, 1998
    Date of Patent: February 20, 2001
    Assignee: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Patent number: 5820950
    Abstract: An optical pellicle and package are disclosed. The optical pellicle includes a pellicle membrane and a pellicle frame with a cover side, a membrane side and an outer edge. The pellicle membrane is mounted and covers a substantial portion of the membrane side of the pellicle frame. The membrane side of the pellicle frame includes a peripheral region that extends beyond the pellicle membrane. In one embodiment of the invention, the peripheral region includes a relieved portion at the periphery of the membrane side of the pellicle frame. Another embodiment includes one of the previously described optical pellicles and a package. The package includes a first piece and a second piece. The first piece includes a structure for supporting an optical pellicle. The structure is configured to support the optical pellicle so that the pellicle membrane is free from contact with the first piece of the package.
    Type: Grant
    Filed: October 30, 1996
    Date of Patent: October 13, 1998
    Assignee: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Patent number: 5772817
    Abstract: One aspect of the invention comprises a method of assembling an optical pellicle including a pellicle frame and a pellicle membrane in which adhesive is first applied to the pellicle frame, and then solvent in the adhesive is permitted to evaporate. Normally the step in which solvent is permitted to evaporate involves baking the frame with the adhesive thereon at an elevated temperature. The pellicle membrane is then placed over the adhesive covered frame, and a laser is used to bond the membrane to the frame. An additional, optional step to this process involves application of the laser to the outer edge of the pellicle membrane after the membrane is mounted to the pellicle frame to trim off excess membrane.
    Type: Grant
    Filed: February 10, 1997
    Date of Patent: June 30, 1998
    Assignee: Micro Lithography, Inc.
    Inventors: Yung-Tsai Yen, Qoang Rung Bih
  • Patent number: 5769984
    Abstract: One aspect of the invention comprises a method of assembling an optical pellicle including a pellicle frame and a pellicle membrane in which adhesive is first applied to the pellicle frame, and then solvent in the adhesive is permitted to evaporate. Solvent is then applied to the adhesive on the pellicle frame, and the pellicle membrane is mounted onto the adhesive on the pellicle frame. Normally the step in which solvent is permitted to evaporate involves baking the frame with the adhesive thereon at an elevated temperature. Also, it is normal that as soon as the solvent is applied to the adhesive on the pellicle frame, once the adhesive feels tacky, the pellicle membrane is mounted in place. An additional step to this process involves generation of heat in the pellicle membrane and the adhesive after the membrane is mounted to the adhesive on the pellicle frame, to further bond the membrane to the frame.
    Type: Grant
    Filed: February 10, 1997
    Date of Patent: June 23, 1998
    Assignee: Micro Lithography, Inc.
    Inventors: Yung-Tsai Yen, Qoang Rung Bih
  • Patent number: 5576125
    Abstract: A method for manufacturing an optical pellicle is disclosed. The method includes the dispensing a quantity of adhesive onto a pellicle membrane in a pattern corresponding to the shape of a pellicle frame, positioning the pellicle membrane and the pellicle frame so that the adhesive and the frame are aligned, and mounting the pellicle membrane and the pellicle frame by bringing the adhesive into contact with the pellicle frame. In one embodiment of the present invention, the pellicle membrane is tensed prior to the application of adhesive onto the membrane. Additionally, other embodiments of the present invention include the applying the adhesive with a dispenser having either a rigid or a flexible distal portion, or a dispenser tip having a distal portion comprising a flexible both a rigid portion and a flexible portion, with the flexible portion at least partially disposed within and partially protruding from the rigid portion.
    Type: Grant
    Filed: July 27, 1995
    Date of Patent: November 19, 1996
    Assignee: Micro Lithography, Inc.
    Inventor: Qoang R. Bih
  • Patent number: 5453816
    Abstract: A protective mask is provided for use with a pellicle which is mounted to a photomask during photolithography, with a light source being directed toward the photomask. The pellicle includes a pellicle membrane mounted to a pellicle frame by a first adhesive layer and with the pellicle frame being mounted to the photomask by a second adhesive layer. The protective mask is fabricated of an opaque material and is positioned between the light source and the two adhesive layers to shield them from the light source.
    Type: Grant
    Filed: September 22, 1994
    Date of Patent: September 26, 1995
    Assignee: Micro Lithography, Inc.
    Inventor: Ching-Bore Wang
  • Patent number: 4470508
    Abstract: A dust and contamination free packaging container is provided. A method of producing contamination free packaging is also included. The package includes mating exterior frame members and spacing blocks for displacing a packaged product from the interior walls of the frame. The interior frame surfaces are coated with a contact adhesive which captures and retains particulate matter with which it comes into contact. Prior to use the contact adhesive surfaces are protected by cover sheets or elements which are readily removed at the time the product is to be inserted into the container. The predominant usage of the containers and method is in the electronic and optical industries and particularly in the packaging of photomask pellicles.
    Type: Grant
    Filed: August 19, 1983
    Date of Patent: September 11, 1984
    Assignee: Micro Lithography, Inc.
    Inventor: Yung-Tsai Yen