Patents Assigned to MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH
  • COMPOSITION SUITABLE FOR USE AS A RELEASE-OPTIMIZED MATERIAL FOR NANOIMPRINT PROCESSES AND USES THEREOF
    Publication number: 20150079351
    Abstract: The present invention relates to a composition suitable for use as a release-optimized material for nanoimprint processes, process of production and uses thereof.
    Type: Application
    Filed: May 24, 2013
    Publication date: March 19, 2015
    Applicant: MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH
    Inventors: Hakki Hakan Atasoy, Gabi Grützner, Marko Vogler