Patents Assigned to MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PROTORESISTSYSTEME GMBH
  • Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof
    Patent number: 10126648
    Abstract: The present invention relates to a composition suitable for use as a release-optimized material for nanoimprint processes, process of production and uses thereof.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: November 13, 2018
    Assignee: MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PROTORESISTSYSTEME GMBH
    Inventors: Hakki Hakan Atasoy, Gabi Grützner, Marko Vogler